SPM Calibration Specimens

Overall Benefits:

• Easier testing of your SPM.
• Improved accuracy of critical dimension measurements.
• Accuracy: 0.5% (1 std. dev.).

Features and Benifits:

• Holographic fabrication - assures high accuracy and precision.
• Pattern height > 100nm - provide excellent image contrast.
• Uniform coverage of entire chip - save time (can image anywhere).

Description:

• Nominal calibrated dimensions: 300 or 700 nm.
• Calibration certificate: supplied with each sample, stating the dimension to the nearest 1 nm.
• Pattern types: 1- or 2—Dimensional. The calibrated dimension is the same for both axes for the 2-D standard.
• Feature geometry:
  -parallel ridges (1-D, 300 or 700nm)
  -cylindrical posts (2-D 300nm)
  -diamond-shaped posts (2-D 700nm)
• Physical Size: 3 mm x 4 mm x 0.5mm.
• Substrate: Silicon wafer.
• Top surface: Tungsten film.

The 1-D standards can be scanned using any AFM mode, including contact mode. The 2-D standards can be scanned using modes such as Tapping Mode™, intermittent contact, and non-contact.

Model 150-1D

Accurate measurements of sub 0.5 micron features are increasingly important as nanotechnology develops and as conventional microfabricated structures (semiconductors, magnetic data storage devices, optical data discs) shrinking. The model 150-1D with a nominal period (pitch) of 150nm, one dimensional, fabricated on a transparent substrate (Aluminum lines on glass) is the new tool to support this work.

Model 750-HD

High Durability Calibration Reference Specimen for AFM and STM

Each specimen is supplied with a calibration certificate.Can be used for ATM, STM and SEM. Has been used successfully in a hot water AFM.

Nominal pattern dimensions:	Pitch 750 nm
	Height 100 nm
Nominal specimen dimensions:	6.35 mm diameter, 0.3 mm thick
Composition:	Solid Nickel

Model PT

Phase Imaging Test Specimen (verify TappingMode™ phase contrast and resolution).

Phase Imaging is a sharp probe, which is brought into proximity with the specimen surface. The probe is oscillated vertically near its mechanical resonance frequency. As the probe lightly taps the surface the amplitude of oscillation is reduced and the AFM uses this change in amplitude in order to track the surface topography. In addition to its amplitude, the probe motion can be characterized by its phase relative to a driving oscillator. The phase signal changes when the probe encounters regions of different composition. Phase shifts are registered as bright and dark regions in phase images, comparable to the way height changes are indicated in height images.

Phase images often show extraordinary contrast for many composite surfaces of technological and scientific interest. These include contamination deposits, discontinuous (i.e. defective) thin films devices built of composite materials (e.g. magnetic recording heads), and cross-sectional specimens of composite materials. Both inorganic and organic materials can be examined. We have found that phase imaging is more convenient and gentler than other methods, which are based on contact mode operation. It routinely achieves lateral resolution of 10 nm.

References

1.Pereira, D.E.D. & Claudio-da-Silva, Jr., E. "Improvement of AFM as an analytical Instrument for Residual Lignin Characterization" in: Proceedings International Symposium on Wood and Pulping Chemistry, Helsinki, Finland, June 1995.

2.Pereira, D.E.D., Chernoff. D., & Claudio-da-Silva, Jr.,E., & Cemuner, B.J„ "The use of AFM to investigate the delignificalion process: Part 1-AFM performance by differentiating pulping processes", to be published.

Ordering for Calibrator only

Product No.	Appli-cation	Product	Pattern	Material	Nominal Pitch	Mounting	Price	Cart
80122-1D	AFM	700-1D	Parallel ridges	W-coated Photoresist on Si	700 nm	15mm steel disk	407.00
80123-1D	AFM	300-1D	Parallel ridges	W-coated Photoresist on Si	300 nm	15mm steel disk	524.00
80122-2D	AFM	700-2D	Array of posts	W-coated Photoresist on Si	700 nm	15mm steel disk	815.00
80123-2D	AFM	300-2D	Array of posts	W-coated Photoresist on Si	300 nm	15mm steel disk	1000.00
80124-HD	AFM, SEM	750-HD	Array of Flat Bumps	Ni	750(X), Z(100)	un-mounted	291.00
80124-EDU	AFM, SEM	302-EDU	Array of Posts	W-coated Photoresist on Si	300 nm	un-mounted	393.00
80124-PT	AFM Phase Imaging	PT	Random hard & soft domain as small as 10nm	Polymer	None	15 mm steel Disk	175.00
80125-1D	AFM, SEM, TOF-SIMS, Auger, etc.	150-1D	Parallel ridge	A1 Lines on Glass	150	un-mounted	640.00

 

Model 150-2D

Very High Resolution Reference and Traceable Standards for Magnification Calibration of AFM, SEM, Auger, and FIB

General Purpose – High Precision

A precision, holographic pattern provides accurate calibration in the horizontal plane for very high resolution, nanometer-scale measurements.

Period: 144 nm pitch, two-dimensional array. Accurate to ± 1 nm. Refer to calibration certificate for actual pitch.

Surface: Aluminum bumps on Silicon, 4x3 mm die. Bump height (about 90 nm) and width (about 75 nm) are not calibrated.

For AFM, use in contact, intermittent contact (TappingMode™) and other modes with image sizes from 250 nm to 10 mm. Available un-mounted or mounted on 12 mm steel disks.

For SEM, an independent analytical lab has tested this specimen in a FE-SEM (field emission scanning electron microscope). They found that the pattern was very uniform and the specimen was easy to image. No significant charging was observed in the voltage range 1- 20 kV.

Usability: the calibrated pattern covers the entire chip. There is sufficient usable area to make tens of thousands of measurements without reusing any areas altered or contaminated by previous scans.

MODEL 150-2D:

This Calibration Reference specimen comes with a nontraceable, manufacturer’s certificate. These states the average period, based on batch measurements.

MODEL 150-2DUTC:

This traceable, Certified Standard is a select grade. Each standard is individually measured in comparison with a similar specimen calibrated at PTB. (PTB, Physikalisch- Technischen Bundesanstald, is the German counterpart of NIST). The uncertainty of single pitch value is typically
±1,4 nm (95% confidence interval). Multi-pitch measurements provide the usual square-root of N improvement in precision.

Easy to use

We recommended Model 150-2D because of its unique characteristics which make it especially easy to use. The specimen is durable and it allows you can scan in contact mode, offering you faster calibration and measurements. This is the only high resolution 2D calibration specimen we have seen that offers the following characteristics:

• 2-dimensional array for simultaneous calibration of X and Y axes.
• Pitch <500 nm.
• Array of pumps mean the image contrast is high even when the probe tip is slightly dull.
• High contrast in contact mode scans.
• The pattern covers the entire die so that you don’t have to hunt for the scan area.

Ordering:

Model 150-2D is available either mounted on a steel disc or unmounted for AFM or Mounted or Unmounted for SEM.

80125-2D-UM	High Resolution Calibration Specimen, Model 150-2D, Unmounted for AFM	1104.00
80125-2D-M *	High Resolution Calibration Specimen, Model 150-2D, Mounted for AFM	1104.00
80125-2D-MS *	High Resolution Calibration Specimen, Model 150-2D, Mounted for SEM	1104.00
80126-2D-UM	High Resolution Calibration Specimen, Model 150-2DUTC, Unmounted for AFM	6338.00
80126-2D-M *	High Resolution Calibration Specimen, Model 150-2DUTC, Mounted for AFM	6338.00
80126-2D-MS *	High Resolution Calibration Specimen, Model 150-2DUTC, Mounted for SEM*	6338.00

*Please state mount desired

Very High Resolution Calibration Reference and Traceable Standard for AFM, SEM, Auger, and FIB

For General Purpose and Metrology Microscopes

 A precision pattern providing accurate calibration in the horizontal plane for very high resolution, nanometer-scale measurements.

Period: 70 nm pitch, one-dimensional array. Accurate to +/- 0.25 nm.  Refer to calibration certificate for actual pitch.

Surface: Silicon Oxide ridges on Silicon, 4x3 mm die.  Ridge height (about 35 nm) and width (about 35 nm) are not calibrated.

For AFM, use in contact, intermittent contact (TappingMode™) and other modes with image sizes from 100 to 3000 nm. Available unmounted or mounted on steel disks.

For SEM, this specimen works well at a wide range of accelerating voltages (1 kV to 20 kV have been tested) and calibrates images from 25 kX to 1000 kX.  Normally supplied unmounted.  Can be mounted on a stub of your choice.

Usability:  The calibrated pattern covers a 1.2x0.5 mm area.  There is sufficient usable area to make thousands of measurements without reusing any areas altered or contaminated by previous scans.

Model 70-1D.  This Calibration Reference specimen comes with a non-traceable, manufacturer’s certificate. This states the average period, based on batch measurements. 

Model 70-1DUTC. This Traceable, Certified Standard is measured in comparison with a standard calibrated at PTB. (PTB, Physikalisch-Technischen Bundesanstalt, is the German counterpart of NIST.  The standard is “NIST-Traceable” by virtue of the mutual recognition agreement between NIST and PTB.)  The uncertainty of single pitch values is typically +/- 0.5 nm (95% confidence interval).  Multi-pitch measurements provide the usual square-root of N improvement in precision. 

AFM Tapping Mode scan

The ridge height is about 35 nm.  This specimen is not recommended as a height reference because the standard AFM probes may not always reach the substrate level between the ridges. Nevertheless, the image contrast is high, even when the probe tip is slightly dull.  You can scan in contact mode, which means you can calibrate and measure faster.

Easy to find Patterned area

The patterned area is easy to find.  The three rectangles shown in the sketch below are visible in reflected light, with either the unaided eye or an optical microscope.  In a low magnification SEM image, the contrast is reversed.  The central rectangle, which is the grating pattern, is relatively bright.  The grating lines are parallel to the long side of the rectangle, as suggested by the high magnification SEM image.

Die and location of pattern within die:	Low magnification SEM image:

SEM High Magnification Image

Magnification= 200 kX
Voltage= 5 kV.

 

Ordering for the Very High Calibration and Traceable Standard:

Please specify the mount type: unmounted, steel disk, SEM pin stub, or any other type of SEM stub.

80127-1D	Calibration Standard, Model 70-1D	each	$1000.00
80127-1DC	Calibration Standard Model 70-1D with Cert	each	$3500.00