Carbon
Coaters, Sputter Coaters and Turbo Sputter Coaters
EMS Series of Rotary Pumped Modular Coating Systems
Innovative and versatile Sputter Coater and Carbon Evaporator for SEM Applications
Quick Overview
The EMS150R is a compact rotary pumped coating system ideally suited for SEM and other coating applications. The EMS150R is available in three formats:
EMS150R S – a compact rotary pumped sputter coater, suitable for non-oxidising metals
EMS150R E – a compact rotary pumped carbon fibre coater suitable for SEM applications
EMS150R ES – a compact rotary pumped combined sputter coater and carbon evaporator
- Click on an image to view.
Key Features
- Metal sputtering or carbon evaporation - or both – in one space saving design
- Rotary pumped sputter coating – allows sputtering of a wide range of non-oxidising (noble) metals, such as gold (Au), platinum (Pt), silver (Ag) and palladium (Pd)
- Carbon fibre coating – ideal for SEM carbon coating applications (eg EDS and WDS)
- Advanced design carbon evaporation gun – simple operation, reproducible results
- Glow discharge option – for modification of sample surface properties (eg hydrophobic
to hydrophilic conversion) or for cleaning / removal of contaminating surface residues - Control of evaporation current profile – ensures consistently reproducible carbon films
- Repeatable thickness control using the film thickness monitor option
- Fully automatic touch screen control – rapid data input, simple operation
- Multiple, customer defined coating protocols can be stored – ideal for multi-user labs
- Automatic vacuum control, which can be pre-programmed to suit the process and material – no needle valve to adjust
- “Intelligent” recognition system – automatically detects the type of coating insert fitted
- Easy-to-change, drop-in style specimen stages (rotation stage as standard)
- Thick film capabilities – up to 60 minutes sputtering time without breaking vacuum
- Ergonomic one piece moulded case – easy maintenance and service access
- Ethernet with local FTP server connection – simple programmer updates
- Power factor correction – complies with current legislation (CE Certification) – efficient use of power means reduced running costs
- Three-year warranty
Product Description
Ideal for SEM applications
EMS150R is available in three formats: sputtering, carbon evaporation or both. Depending upon the selected configuration, the EMS150R can be a top-of-the-range sputter coater for scanning electron microscopy (SEM), a carbon coater suitable for SEM (eg EDS and WDS), or both, in a single easy to use system.
Molded case with color touch-screen
The EMS150R is presented in a custom molded, one-piece case. The color touch screen allows multiple users to input and store coating protocols. The case houses all the working components. Automatic bleed control ensures optimum vacuum conditions during sputtering.
The vacuum chamber has an external diameter of 165mm (6.5”) and comes with an integral implosion guard. A variable speed rotary specimen stage is fitted as standard, with other stages available as options.
Sputter coating, carbon coating or both
The EMS150R is available in three formats, each with a range of optional accessories:
- EMS150R S – a compact rotary pumped sputter coater, suitable for non-oxidising (noble) metals. A wide selection of sputtering targets is available, which are highly recommended for SEM applications.
- EMS150R E – a compact rotary pumped carbon fibre coater suitable for SEM applications (eg EDS and WDS). The system uses carbon fibre / cord as standard.
- EMS150R ES – a combined system with both sputtering and carbon fibre coating. The deposition inserts can be swapped in seconds and the intelligent system logic automatically recognizes which insert is in place and displays the appropriate operating settings.
Each of the above can be fitted with a range of optional accessories (eg glow discharge, carbon rod coating, film thickness monitor). See options for details.
Rapid data entry
At the operational heart of EMS150R is a simple color touch screen, which allows even the most inexperienced or occasional operators to rapidly enter and store their own process data. To further aid ease of use a number of typical sputtering and evaporation profiles are already stored.
Maintenance
The intuitive touch screen interface features maintenance prompts which highlight:
- Time of last clean
- Coating time since last cleaned
- System „on time‟
- Time of last service
Specifications
| Instrument case | 585mm W x 470mm D x 410mm H (total height with coating head open: 650mm) |
| Weight | 28.4kg |
| Packed dimensions | 725mm W x 660mm D x 680mm H (36.8kg) |
| Work chamber | Borosilicate glass 152mm Ø (inside) x 127mm H |
| Safety shield | Integral polyethylene terephthalate (PET) cylinder |
| Display | 145mm 320 x 240 colour graphic TFT (Thin Film Transistor) display |
| User Interface | Intuitive full graphical interface with touch screen buttons, includes features such as reminders for when maintenance is due and a log of the last ten coatings carried out |
| Sputtering target | Disc style 57mm Ø. A 0.1mm thick gold target is fitted as standard. Q150R S and Q150R ES versions only |
| Specimen stage | 50mm Ø rotating stage with 6 stub positions for 15mm, 10mm, 6.5mm or 1/8” pin stubs. Rotation speed 8-20 rpm |
Vacuum
| Rotary pump | Edwards RV3 50L/s two-stage rotary pump, with vacuum hose, coupling kit and oil mist filter |
| Vacuum measurement | Pirani gauge fitted as standard |
| Typical ultimate vacuum | 2 x 10-2mbar in a clean system after pre pumping with dry nitrogen gas |
| Sputter vacuum range | Between 3 x 10-2 and 5 x 10-1mbar |
Processes
| Sputtering | 0-80mA to a pre-determined thickness (with optional FTM) or by the built-in timer. The maximum sputtering time is 60 minutes (without “breaking” vacuum and with built in rest periods) |
| Carbon evaporation | A robust, ripple free D.C. power supply featuring pulse evaporation ensures reproducible carbon evaporation from fibre, cord or rod sources. Current pulse for carbon cord: 1-60 Amps; current pulse for carbon rods with spigot size of 1.4mm Ø: 1-90 Amps |
| Glow discharge | 0-80mA operates in DC+ and DC- modes |
Services and other information
| Gases | Argon sputtering process gas, 99.999% (R S and R ES versions). Nitrogen venting gas (optional) |
| Electrical supply | 90-250V ~ 50/60 Hz 1400 VA including RV3 rotary pump power. 110/240V voltage selectable |
| Conformity | CE conformity |
| Power factor correction | Complies with the current legislation (CE Certification) and ensures efficient use of power which means reduced running costs |
Ordering Information
EMS150R S
| 4500 | EMS150R S Rotary pumped sputter coater, includes an 57mm Ø x 0.1mm gold target | POR | Request Quote |
| 4501 | Quick-release sputter insert for EMS150R S and EMS150R ES – suitable for non-oxidising (noble) metals. Supplied with A 57mm Ø x 0.1mm thick gold target as standard. For additional noble metal targets (eg Platinum, Gold / Palladium, Silver) see Sputtering Targets section | Included | |
| 4502 | Rotation stage, 50mm Ø with adjustable height for target to sample distances of 38mm-79mm (supplied with 2 mounting pillars). Note: this stage does not tilt – for tilting stage see Specimen Stages section | Included |
EMS150R E
| 4503 | EMS150R E Rotary pumped carbon fibre evaporator, supplied with carbon fibre / cord | POR | Request Quote |
| 4504 | Quick-release carbon fibre evaporation insert for EMS150R E and EMS150R ES – suitable for evaporation of carbon fibre and carbon cord | Included | |
| 4506 | Rotation stage, 50mm Ø with adjustable height for target to sample distances of 38mm-79mm (supplied with 2 mounting pillars). Note: this stage does not tilt – for tilting stage see Specimen Stages section | Included |
EMS150R ES
| 4507 | EMS150R ES Rotary pumped sputter coater, includes an 57mm Ø x 0.1mm gold target, and carbon fibre evaporator, supplied with carbon fibre / cord | POR | Request Quote |
| 4508 | Quick-release sputter insert for EMS150R S and EMS150R ES – suitable for non-oxidising (noble) metals. Supplied 57mm Ø x 0.1mm thick gold target as standard. For additional noble metal targets (eg Platinum, Gold / Palladium, Silver) see Sputtering Targets section | Included | |
| 4509 | Quick-release carbon fibre evaporation insert for EMS150R E and EMS150R ES – suitable for evaporation of carbon fibre and carbon cord | Included | |
| 4510 | Rotation stage, 50mm Ø with adjustable height for target to sample distances of 38mm-79mm (supplied with 2 mounting pillars). Note: this stage does not tilt – for tilting stage see Specimen Stages section | Included |
Options and Accessories
A range of interchangeable, plug-in style coating inserts are available:
| 4511 | Additional sputter insert for quick metal change (R S and R ES only). Note: this is an entire sputtering assembly; individual noble metal targets can also be purchased | POR | Request Quote |
| 4512 | Carbon rod evaporation insert for 3.05mm Ø rods (R E and R ES only). Includes manual rod shaper and 3.05mm Ø carbon rod | POR | Request Quote |
| 4513 | Glow discharge insert to modify surface properties (eg hydrophobic to hydrophilic conversion) or to clean surface residues (R S and R ES only). Can be retrofitted | POR | Request Quote |
| 4514 | Additional standard glass chamber assembly | POR | Request Quote |
| 4515 | Extended height vacuum chamber (214mm high – the standard chamber is 127mm high). For increased source to sample distance and for coating large specimens | POR | Request Quote |
| 4516 | Rotating vacuum spigot allows more convenient connection of the vacuum hose to the rear of the ems150R when bench depth is limited | POR | Request Quote |
| 4517 | Film thickness monitor (FTM) attachment. Consists of a built in chamber mounted quartz crystal oscillator (includes crystal). As sputtered or evaporated material is deposited onto the crystal, so its frequency of oscillation is modified. This „modification‟ is used to measure and control the thickness of material deposited | POR | Request Quote |
| 4518 | Spare quartz crystal | POR | Request Quote |
Specimen stages
The EMS150R has alternative specimen stages to meet most requirements. All are easy-change, drop-in style and are height adjustable (except 10360 rotary planetary stage)| 4519 | 50mm Ø rotate-tilt specimen stage with adjustable tilt (up to 90 degrees) and height (37mm-60mm). Has six stub positions for 15mm or 6.5mm or 1/8" pin stubs. Stage rotation speed variable between 8 and 20rpm | POR | Request Quote |
| 4520 | 90mm Ø rotating specimen stage for glass microscope slides (up to two x 75mm x 25mm slides). Stage rotation speed variable between 8 and 20rpm | POR | Request Quote |
| 4521 | Variable angle “Rotacota” rotary planetary stage with 50mm Ø specimen platform. Has six stub positions for 15mm or 6.5mm or 1/8" pin stubs. Stage rotation speed variable between 8 and 20rpm | POR | Request Quote |
| 4522 | Flat rotation specimen stage for 100mm / 4” wafers, includes gearbox for increased coverage. Stage rotation speed variable between 8 and 20rpm | POR | Request Quote |
Carbon Supplies
| 4538 | Carbon fibre cord - high purity - 1m | POR | Request Quote |
| 4539 | Carbon fibre cord - high purity - 5m | POR | Request Quote |
| 4540 | Carbon fibre cord - standard grade - 1m | POR | Request Quote |
| 4541 | Carbon fibre cord - standard grade - 10m | POR | Request Quote |
| 4542 | Carbon fibre cord - standard grade - 100m | POR | Request Quote |
| 4543 | Carbon rods - 3.05mm Ø x 50mm length (shaped) pack of 10 | POR | Request Quote |
| 4544 | Carbon rods 3.05mm Ø x 300mm length (unshaped) pack of 10) | POR | Request Quote |
| 4546 | Manual rod shaper for 3.05mm Ø carbon rods | POR | Request Quote |
Sputtering Targets
| 4523 | 57mm Ø x 0.1mm Gold | POR | Request Quote |
| 4524 | 57mm Ø x 0.2mm Gold | POR | Request Quote |
| 4525 | 57mm Ø x 0.3mm Gold | POR | Request Quote |
| 4526 | 57mm Ø x 0.1mm Gold/Palladium (80/20%) | POR | Request Quote |
| 4527 | 57mm Ø x 0.2mm Gold/Palladium (80/20%) | POR | Request Quote |
| 4528 | 57mm Ø x 0.3mm Gold/Palladium (80/20%) | POR | Request Quote |
| 4529 | 57mm Ø x 0.1mm Platinum | POR | Request Quote |
| 4530 | 57mm Ø x 0.2mm Platinum | POR | Request Quote |
| 4561 | 57mm Ø x 0.3mm Platinum | POR | Request Quote |
| 4532 | 57mm Ø x 0.1mm Nickel | POR | Request Quote |
| 4533 | 57mm Ø x 0.1mm Silver | POR | Request Quote |
| 4534 | 57mm Ø x 0.1mm Palladium | POR | Request Quote |
| 4535 | 57mm Ø x 0.1mm Copper | POR | Request Quote |
| 4536 | 57mm Ø x 0.1mm Platinum/Palladium (80/20%) | POR | Request Quote |
| 4537 | 57mm Ø x 0.3mm Platinum/Palladium (80/20%) | POR | Request Quote |
Spare kits
| 4547 | Two-year spares kit for EMS150R S Includes: 57mm Ø x 0.1mm gold target, standard glass chamber assembly quartz crystals, O-rings |
POR | Request Quote |
| 4548 | Two-year spares kit for EMS150R E Includes:, carbon fibre / cord, standard glass chamber assembly, quartz crystals, O-rings, springs |
POR | Request Quote |
| 4549 | Two-year spares kit for EMS150R ES Includes: 57mm Ø x 0.1mm gold target, / carbon fibre / cord, standard glass chamber assembly, quartz crystals, O-rings, springs |
POR | Request Quote |
SEM/TEM Carbon Coaters Techniques and Applications
Silver as a Removable Coating for Scanning Electron Microscopy
EMS 400 and 450 Carbon Coater
The EMS 400 and 450 are no longer available and have been replaced by the EMS 150R series coaters.
- EMS150R E – a compact rotary pumped carbon fibre coater suitable for SEM applications (eg EDS and WDS). The system uses carbon fibre / cord as standard.
- EMS150R ES – a combined system with both sputtering and carbon fibre coating. The deposition inserts can be swapped in seconds and the intelligent system logic automatically recognizes which insert is in place and displays the appropriate operating settings.
The complete product listing is included above. Please click for details.
EMS EMS150R S and EMS150R ES Sputter Coaters
EMS is pleased to offer the 150R series sputter coater and combined carbon and sputter coater.
- EMS150R S a compact rotary pumped sputter coater, suitable for non-oxidising (noble) metals.
- EMS150R ES – a combined system with both sputtering and carbon fibre coating.
The complete product listing is included above. Please click for details.
EMS 500 and EMS 550 Sputter Coater
The EMS 550 system employs a Magnetron Target Assembly which enhances the efficiency of the process using low voltages, and giving a Fine Grain, Cool Sputtering, without the need to cool the target or the specimen stage.
The specimen stage height is adjustable in discreet steps, accommodates a range of specimens and stubs, which together with pre-selectable parameters and Automatic Control, gives defined and repeatable film thickness depositions.
The instrument is fitted with 60mm (Dia) and 0.1mm (T) gold (or Customer choice) quick change target, giving optimum consumable cost performance.
The integrated instrument panel and plug-in electronics, maximize ‘up-time’ and, with user friendly designs, ensures satisfactory multi-user discipline.
The sputtering parameters can be pre-set, including the gas bleed needle valve which has electromagnetic valve back-up.
The sputtering head is interlocked, and the system can easily accommodate the 7640 Carbon Coating Attachment.
The independent vacuum pump is controlled by the instrument throughout the fully automatic coating cycle.
The EMS 500 is a manual version of the EMS 550 without a rotary stage. All other features and specifications are the same.
Features
- Built-in rotary and tilt stage.
- Fully automatic control.
- Low energy ‘cool’ system (order of 2 Watts for cycle of 2 mins is 240 joules).
- Low voltage sputtering (Order of 100V mean DC temperature increase less than 2°C/minute).
- High resolution fine coating (Fine grain size).
- Precise reproducible coatings.
- Even thickness deposition (Typically 20 nm or 20 Angstroms for SEM work).
- Modular control electronics.
- Multi specimen holder
- Polycarbonate safety shield.
Specifications
| Instrument Case | 450mm(W) x 350mm(D) x 175mm(H) |
| Work Chamber | Borosilicate Glass 165mm (Dia.) x 125mm (H) |
| Weight | 18Kg |
| Target | 60mm (Dia.) x 0.1mm (Thick) (Gold fitted as standard) |
| Specimen stage | 60mm (Dia.) Adjustable height spacing to target 25mm to 45mm |
| Vacuum Gauge Range | ATM 1x10-2 mbar |
| Deposition Range | 0-50mA |
| Deposition Rate | 0-25nm/minute |
| Sputter Timer | 0-4 minutes |
| Supply | 115V 60Hz 230V 50Hz (6 Amp Max incl pump) |
| Services | Argon Nominal 4 psi |
| Vacuum Pump | Complete with vacuum hose and oil mist filter 85L/Min (Recommended) |
| Size | 470mm(L) x 150mm(W) x 250mm(H) |
| Weight | 20Kg |
Ordering Information
| 91000 | EMS 550 Sputter Coater complete with Target | POR | Request Quote |
| 91000-MA | EMS 500 Manual Sputter Coater | POR | Request Quote |
| 91005 | Rotary Vacuum Pump Targets 60mm (Dia.) x 0.1mm (Thick) fitted inclusive as standard |
$2,566.00 | Add to Cart |
Replacement Targets
| 91010 | Gold Target | $750.00 | Add to Cart |
| 91011 | Gold/Palladium Target | $750.00 | Add to Cart |
| 91012 | Platinum Target | $850.00 | Add to Cart |
Replacement Parts
| 91013 | Glass Cylinder 165mm (6") | $175.00 | Add to Cart | |
| 91014 | "L" Gaskets to suit 165mm (6") cylinder | 1 pair | $95.00 | Add to Cart |
Optional Accessories
| 91042 | EMS 125 Etch Facility | POR | Request Quote |
| 91006 | EMS 150 Film Thickness Monitor | POR | Request Quote |
| 92030 | EMS 175 Oscillating Stage | POR | Request Quote |
| EMS 7640-CF Carbon Firber Coating Attachment | POR | Request Quote | |
| EMS 7640-CR Carbon Rod Coating Attachment | POR | Request Quote |
EMS 575T Twin Head Sputter Coater
The EMS 575 uses a ‘Turbo’ pump, backed up by a Rotary Vacuum pump, the complete pumping sequence being under automatic control, and the vacuum on the order of 1 x 10-3 mbar.
A rotating specimen table is employed to ensure that these ultra thin films are evenly deposited onto the specimen.
The system employs a Magnetron Target assembly, fitted with a 54mm (Dia.) quick change target. The sputtering parameters can be pre-set including gas bleed needle valve which has electromagnetic valve back-up.
The vacuum can be adjusted to suit conditions for Chromium or Gold targets, and has a dual range Timer to allow for a range of sputtering times.
The system has peltier cooling built-in giving improved sputtering performance.
The EMS 575T has two heads and the stage is arranged such that the sample can be coated with one material, then another without breaking vacuum.
Features
- Fully automatic control
- Built-in specimen holder
- Built-in penning head and gauge
- Ultra high resolution (Less than 0.5nm Chromium Grain size)
- Thin film deposition (Typically 5nm)
- Rotating and tilting specimen table
- Turbo molecular pumping system
- Modular control electronics
- Clean line design
- Polycarbonate safety shield
- Peltier cooled sputter head
Specifications
| Instrument Case | 450mm (W) x 350mm (D) x 175mm (H) |
| Work Chamber | Borosilicate Glass: 165mm (Dia.) x 125mm (H) |
| Plus Stainless Steel Base | 110mm (Dia.) x 115mm (H) |
| Weight | 42Kg |
| Target | 57mm (Dia.) x 0.2mm (Thick) (Chromium fitted as standard) |
| Specimen stage | 60mm (Dia.) Rotating Table at 60 r.p.m. |
| Vacuum Gauge Range (Penning) | ATM to 1x10-5 mbar (Penning) |
| Operating Vacuum | 1x10-3 mbar to 1x10-4 mbar |
| Deposition Rate | 0-175mA |
| Sputter Timer | 0-4 minutes |
| Power Supply | 1000v at 100 ma, 100 watts |
| Plasma Voltage | 150v mean dc at 100ma, 15 watts max rating |
| Deposition Rate | 30 nm/min at 100ma |
| Turbomolecular Pump | 60 litres/second (Ultimate vacuum 1x10-8 mbar) |
| Supply | 115V 60Hz (12 Amp Max incl pump) 230V 50Hz (6 Amp Max incl pump) |
| Services | Argon Nominal 4 psi |
| Vacuum Pump (Recommended) | Complete with vacuum hose and oil mist filter 85L/Min |
| Size | 470mm (L) x 150mm (W) x 250mm (H) |
| Weight | 20Kg |
Ordering Information
| 91110-TH | EMS 575T Twin Head Sputter Coater complete with Target | POR | Request Quote |
| 91005 | Rotary Vacuum Pump | $2,566.00 | Add to Cart |
| 92045 | EMS 50 Water Chiller | POR | Request Quote |
Replacement Targets
| 91010 | Gold Target | 750.00 | Add to Cart |
| 91011 | Gold/Palladium Target | 750.00 | Add to Cart |
| 91012 | Platinum Target | 850.00 | Add to Cart |
| 91013 | Chromium Target | POR | Request Quote |
| 91014 | Tungsten Target | POR | Request Quote |
Optional Accessories
| 91048 | EMS 140 Cold Trap | POR | Request Quote |
| 91006 | EMS 150 Film Thickness Monitor | POR | Request Quote |
Silver as a Removable Coating for Scanning Electron Microscopy
EMS 650 Large Sample Coater and EMS 650T Turbo Large Sample Coater
The EMS 650 system employs Magnetron Target Assemblies which enhances the efficiency of the process using Low Voltages, and giving a Fine Grain, Cool Sputtering, without the need to cool the target or the specimen stage.
There are three such target assemblies in the EMS 650, positioned to give coating over a large diameter which, together with a rotating sample table, ensures even depositions. This method allows standard targets to be utilized, and avoids the necessity of special large profiled targets.
This triple-target system is particularly useful in the Semiconductor Wafer Industry.
The Instrument is fitted with three 60mm diameter and 0.1mm thick gold (or Customer choice) quick change targets, giving optimum consumable cost performance.
The integrated instrument panel and plug-in electronics maximize ‘up-time’ and, with user friendly designs, ensure satisfactory multi-user discipline.
The sputtering parameters can be pre-set, including the gas bleed needle valve which has electromagnetic valve back-up which, together with Automatic Control, gives defined and repeatable film thickness depositions.
The sputtering head is interlocked, and the system can easily accommodate the EMS 7640 Carbon Coating Attachment.
The independent vacuum pump is controlled by the instrument throughout the fully automatic coating cycle.
The EMS 650T is the exact same as the EMS 650 with the addition of it having a turbo pump pumping at 60 L/sec for higher and cleaner vacuum.
Features
- Fully automatic control.
- Low energy ‘cool’ system (Order of 6 Watts for cycle of 2 mins is 720 joules).
- Low voltage sputtering (Order of 100V mean DC temperature increase less than 2°C/minute).
- High resolution fine coating (Order of 2nm Gold Grain).
- Precise reproducible coatings.
- Even thickness deposition (Typically 20nm or 200 Angstroms for SEM work).
- Modular control electronics.
- Clean line design.
- Rotating and tilting specimen stage 155mm (Dia) (Coating to 205mm Dia.).
- Triple target sputtering (3 x 60mm(Dia.)
Targets). - Polycarbonate safety shield
Specifications
| Instrument Case | 450mm (W) x 350mm (D) x 175mm (H) |
| Work Chamber | Borosilicate Glass: 225mm(Dia.) x 125mm(H) |
| Weight | 24Kg |
| Targets | (3) x 60mm Dia. x 0.1mm thick |
| Rotating Specimen Stage | 155mm Dia. Adjustable Height spacing to target 40 to 50mm |
| Vacuum Gauge Range | ATM 1x10-2 mbar |
| Deposition Range | 0-100mA |
| Deposition Rate | 0-20nm/minute |
| Sputter Timer | 0-4 minutes |
| Supply | 115 volts 60 Hz (16 Amp Max incl pump) 230 volts 50Hz (8 Amp Max incl pump) |
| Services | Argon Nominal 4 psi |
| Vacuum pump | 90L/m or greater . Range: to 10-2mbar |
| Size | 470mm (L) x 150mm (W) x 250mm (H) |
| Weight | 23Kg |
Ordering Information
| 91020 | EMS 650 Sputter Coater complete with Targets (3) x 60mm Dia. x 0.1mm thick fitted inclusive as standard |
POR | Request Quote |
| 91020T | EMS 650T Sputter Coater | POR | Request Quote |
| 91025 | Rotary Vacuum Pump | $2,808.00 | Add to Cart |
Replacement Targets
(Recommended change as set of three)
| 91030 | Gold Targets (x3) | $2,000.00 | Add to Cart |
| 91031 | Gold/Palladium Targets (x3) | $2,000.00 | Add to Cart |
| 91032 | Platinum Targets (x3) | $2,000.00 | Add to Cart |
Replacement Parts
| 91033 | Glass Cylinder 225mm (8") | $650.00 | Add to Cart | |
| 91034 | "L" Gaskets to suit 225mm (8") cylinder | 1 pair | $400.00 | Add to Cart |
Optional Accessories
| 91042 | EMS 125 Etch Facility | POR | Request Quote |
| 91006 | EMS 150 Film Thickness Monitor | POR | Request Quote |
| EMS 7640-CF Carbon Firber Coating Attachment | POR | Request Quote | |
| EMS 7640-CR Carbon Rod Coating Attachment | POR | Request Quote |
Silver as a Removable Coating for Scanning Electron Microscopy
EMS 675X High Resolution, Large Sample Sputter Coater
A complete 8 inch (200mm) wafers can be coated in The EMS675X Sputtering Coater System. The base system with twin gear rotating sample stage gives a progressive elliptical rotation for even sputtering deposition.
The EMS675X Coating System employs a magnetron target assembly which enhances the efficiency of the Sputtering process using low voltages, giving a thin and fine grain coating.
There are three such target assemblies in the EMS675X, positioned to give coating over a large diameter which, together with a rotating sample table, ensures even depositions. This method allows standard targets to be utilized, and avoids the necessity of special large profile targets.
The multi-target system is particularly useful in the semi-conductor wafer industry. It has a turbo molecular pump backed by a Rotary Vacuum Pump.
The integrated instrument panel and plug-in electronics maximize “up-time” and, with user-friendly designs, ensures satisfactory multi-user discipline.
The sputtering parameters can be pre-set, including the gas bleed needle valve, which has electromagnetic valve back-up.
The independent Vacuum Pump is controlled by the Instrument throughout the fully automatic coating cycle. It can be used to Sputter Coat targets such as Gold, and also targets that may need pre-cleaning, or the removal of oxide layers, such as Chromium.
A shutter assembly is fitted as standard, which allows a Sputter Cleaning and the Sputter Cycle to be carried out while maintaining the vacuum.
Features
- Equipped with three sputter targets
- Turbo molecular pumping system
- Fully Automatic Control
- Peltier cooled sputter head
- Fine Coating (Order of 0.5nm Cr Grain Size)
- Special Rotating Stage with full Tilt Facility
fitted as standard - Thin Film Deposition (typically 5nm)
- 300mm Diameter Chamber
- Dual sputter head available as an option
Benefits
- Allows coating of large samples such as 8" wafers
- Allows sputtering of fine grain oxidizingmetals such as Cr or Ir
- Easy to operate
- No cooling water required
- Ultra high resolution reproducible coatings
- Fully adaptable to a wide range of specimens
- Repeatable film thickness depositions
- Easy loading and unloading
Specifications
| Instrument Case | 450mm W x 500mm D x 300mm H (Overall height of unit 630mm) |
| Work Chamber | Borosilicate Glass 300mm Dia. x 20mm H |
| Safety Shield | Polycarbonate cylinder |
| Weight | 42Kg |
| Targets | Three x 54mm Dia. x 0.3mm Thick Chromium fitted as standard |
| Rotating Specimen Stage | Adjustable for 6 to 8 inch Wafers, Height spacing to target 60mm |
| Vacuum Gauge | Atmos.: 1x10-5 mbar |
| Deposition | 0-450mA |
| Deposition Rate | 0-15nm/minute |
| Sputter Timer | 0-4 minutes (multiple cycles possible) |
| Supply | 115 volts 60 Hz (16 Amp Max incl pump) 230 volts 50Hz (8 Amp Max incl pump) |
| Services | Argon: Nominal 10 psi, Nitrogen: Nominal 10 psi (Argon may be used as common gas) |
| Rotary Backing Pump | Two Stage Vacuum Pump No.2, 35L/Min complete with Vacuum Hose and Oil Mist Filter. 2m3 |
Ordering Information
| 91026 | EMS675X Turbo Sputter Coater complete with Three targets | each | POR | Request Quote |
| 91025 | Rotary Vacuum Pump | each | $2,808.00 | Add to Cart |
Replacement Targets (Recommended change as set of 3)
| 91030 | Gold Targets (x3) | each | $2,000.00 | Add to Cart |
| 91031 | Gold Palladium Targets(x3) | each | $2,000.00 | Add to Cart |
| 91032 | Platinum Targets(x3) | each | $2,000.00 | Add to Cart |
| 91013 | Chromium Targets (x3) | each | POR | Request Quote |
| 91014 | Tungsten Targets (x3) | each | POR | Request Quote |
Replacement Parts
| 91033 | Glass Cylinder 225mm | each | $650.00 | Add to Cart |
| 91034 | L Gaskets (x2) | 1 pair | $400.00 | Add to Cart |
Optional Accessories
| 91006 | EMS 150 Film Thickness Monitor | each | POR | Request Quote |
| 92030 | EMS 175 Oscillating Stage | each | POR | Request Quote |
| EMS 7640-CF Carbon Firber Coating Attachment | each | POR | Request Quote | |
| EMS 7640-CR Carbon Rod Coating Attachment | each | POR | Request Quote |
Silver as a Removable Coating for Scanning Electron Microscopy
