Carbon
Coaters, Sputter Coaters and Turbo Sputter Coaters
EMS 400 and 450 Carbon Coater
CARBON COATING:
The use of Carbon Films in Electron Microscopy with their LOW background signal, and relatively good electrical conductivity is well known. Thin films, nominally 5nm or 50 Angstroms, are used in TEM, while a range of somewhat thicker films, ranging from 50nm or 500 Angstroms, may be used in SEM for such applications as X-Ray Microanalysis.
Commonly, a high vacuum evaporator with carbon rods is used to achieve these coatings, and still has preferential applications. The use of carbon fiber however, has allowed a flash evaporation technique to be developed which can be suitable for a number of general EM requirements.
The EMS 450 uses several Carbon Fiber types to cover a range of deposition thicknesses operating at rotary vacuum pressures. Coating is omni-directional, and this fully Automatic System has a relatively short cycle time on the order of 5 minutes.
The system employs Low Voltage, High Current, electrodes between which the carbon fiber is located. The electrode assembly employs a protective shutter to protect the specimen from heat radiation damage during the timed outgassing of the carbon fiber process. At completion of this process, the shutter automatically retracts, and full power is applied to the electrodes, causing the carbon to burn quickly or 'Flash' the fiber fusing as part of the process. At this point, the shutter returns to the protective position. The controls can be pre-selected to allow for different types of carbon fiber. This, together with an adjustable specimen stage to the electrode distance, and fully automatic control, allows repeatable deposition thickness to be achieved. The vacuum cycle, and external rotary vacuum pump, being fully controlled by the Instrument.
The EMS 400 is a manual version of the EMS 450 without the rotating stage and manual outgas and shutter operation. All other features and specifications are the same as the EMS 450.
Features
- Full automatic control.
- Automatic protection shutter.
- Reproducible coatings.
- Even thickness deposition over a range of coatings using string or cord.
- Restricted vent control avoiding specimen disturbance.
- Spring loaded 'Quick Load' electrodes.
- Modular control electronics.
- Clean line design.
- Safety shield made from polycarbonate
Specifications
| Instrument Case | 450mm(W) x 350mm(D) x 175mm(H) |
| Work Chamber | Borosilicate Glass: 165mm(Dia.) x 125mm(H) |
| Weight | 25Kg |
| Carbon Source | Carbon String, Carbon Cord |
| Specimen Stage | 60mm (Dia.) Adjustable height spacing to electrodes 55mm to 75 mm |
| Vacuum Gauge | ATM 1x10-2 mbar |
| Ammeter Gauge | 50 Amps |
| Low Voltage | 25 volts |
| Outgas Current | Selectable for 1 x String, 2 x String, 3 x String, 1 x Cord |
| Supply | 115 Volts 60 Hz (12 Amp Max) 230 Volts 50 Hz (6 Amp Max) |
| Vacuum Pump (Recommended) | Complete with vacuum hose and oil mist filter 85L/Min |
| Size | 420mm(L) x 185mm(W) x 250mm(H) |
| Weight | 22Kg |
Ordering Information
| 91050 | EMS 450 Carbon Coater complete with carbon sources | POR | Request Quote |
| 91050-MA | EMS 400 Manual Carbon Coater complete with carbon sources (Carbon Sources1 Mtr String + 1 Mtr Cord supplied as standard) | POR | Request Quote |
| 91005 | Rotary Vacuum Pump | $2,306.00 | Add to cart |
Replacement Sources
| 91045 | Carbon String, 1 meter | meter | $25.00 | Add to Cart |
| 91046 | Carbon Cord, 1 meter | meter | $28.00 | Add to Cart |
Replacement Parts
| 91013 | Glass Cylinder 165mm (6") | $175.00 | Add to Cart | |
| 91014 | "L" Gaskets to suit 165mm (6") cylinder | 1 pair | $95.00 | Add to Cart |
Optional Accessories
| 94100 | EMS 100 Glow Discharge Attachment | POR | Request Quote |
| 91006 | EMS 150 Film Thickness Monitor | POR | Request Quote |
| 91082 | EMS 350 Sputtering Attachment | POR | Request Quote |
EMS 500 and EMS 550 Sputter Coater
What is SPUTTER COATING?
When a glow discharge is formed between a Cathode and Anode using a suitable gas (typically Argon), and Cathode target material (commonly Gold) the bombardment of the target with gas ions will erode this target material, this process being termed 'Sputtering'.
The resulting omni-directional deposition of sputtered atoms will form an even coating on the surface of the specimen, normally located on the stage (anode) of the instrument. This electrically conductive thin coating will be representative of the surface of the specimen. It will inhibit charging, reduce thermal damage, and improve secondary electron emission which are beneficial for Scanning Electron Microscopy.
The EMS 550 system employs a Magnetron Target Assembly which enhances the efficiency of the process using low voltages, and giving a Fine Grain, Cool Sputtering, without the need to cool the target or the specimen stage.
The specimen stage height is adjustable in discreet steps, accommodates a range of specimens and stubs, which together with pre-selectable parameters and Automatic Con-trol, gives defined and repeatable film thickness depositions.
The instrument is fitted with 60mm (Dia) and 0.1mm (T) gold (or Customer choice) quick change target, giving optimum consumable cost performance.
The integrated instrument panel and plug-in electronics, maximize 'up-time' and, with user friendly designs, ensures satisfactory multi-user discipline.
The sputtering parameters can be pre-set, including the gas bleed needle valve which has electromagnetic valve back-up.
The sputtering head is interlocked, and the system can easily accommodate the EMS 250 Carbon Coating Attachment
The independent vacuum pump is controlled by the instrument throughout the fully automatic coating cycle.
The EMS 500 is the manual version of the EMS 550 without a rotary stage. All other features and specifications are the same.
Features
- Multi specimen holder
- Built in rotary and tilt stage
- Fully automatic control.
- Low energy 'cool' system (order of 2 Watts for cycle of 2 mins is 240 joules).
- Low voltage sputtering (Order of 100V mean DC temperature increase less than 2°C/minute).
- High resolution fine coating (Order of 2nm Gold Grain).
- Precise reproducible coatings.
- Even thickness deposition (Typically 20 nm or 20 Angstroms for SEM work).
- Modular control electronics.
- Clean line design.
- Safety shield made from polycarbonate
Specifications
| Instrument Case | 450mm(W) x 350mm(D) x 175mm(H) |
| Work Chamber | Borosilicate Glass: 165mm(Dia.) x125mm(H) |
| Weight | 18Kg |
| Target | 60mm(Dia.) x 0.1mm(Thick) (Gold fitted as standard) |
| Specimen stage | 60mm (Dia.) Adjustable height spacing to target 25mm to 45mm |
| Vacuum Gauge Range | ATM 1x10-2 mbar |
| Deposition Range | 0-50mA |
| Deposition Rate | 0-25nm/minute |
| Sputter Timer | 0-4 minutes |
| Supply | 115 Volts 60 Hz (12 Amp Max incl pump) 230 Volts 50 Hz (6 Amp Max incl pump) |
| Services | Argon Nominal 4 psi |
| Vacuum Pump (Recommended) | Complete with vacuum hose and oil mist filter 85L/Min |
| Size | 470mm(L) x 150mm(W) x 250mm(H) |
| Weight | 20Kg |
Ordering Information
| 91000 | EMS 550 Sputter Coater complete with Target | POR | Request Quote |
| 91000-MA | EMS 500 Manual Sputter Coater | POR | Request Quote |
| 91005 | Rotary Vacuum Pump Targets 60mm (Dia.) x 0.1mm (Thick) fitted inclusive as standard | $2,306.00 | Add to Cart |
Replacement Targets
| 91010 | Gold Target | $750.00 | Add to Cart |
| 91011 | Gold/Palladium Target | $750.00 | Add to Cart |
| 91012 | Platinum Target | $750.00 | Add to Cart |
Replacement Parts
| 91013 | Glass Cylinder 165mm (6") | $175.00 | Add to Cart | |
| 91014 | "L" Gaskets to suit 165mm (6") cylinder | 1 pair | $95.00 | Add to Cart |
Optional Accessories
| 91042 | EMS 125 Etch Facility | POR | Request Quote |
| 91006 | EMS 150 Film Thickness Monitor | POR | Request Quote |
| 92030 | EMS 175 Oscillating Stage | POR | Request Quote |
| 92035 | EMS 180 Heating Stage | POR | Request Quote |
| 91040 | EMS 250 Carbon Coating Attachment | POR | Request Quote |
EMS 575X Turbo Sputter Coater and EMS
575T Twin Head Sputter Coater
SPUTTER COATING:
When a glow discharge is formed between a Cathode and Anode using a suitable gas (typically Argon), and Cathode target material (commonly Gold) the bombardment of the target with gas ions will erode this target material, this process being termed 'Sputtering'.
The resulting omni-directional deposition of sputtered atoms will form an even coating on the surface of the specimen. It will inhibit charging, reduce thermal damage, and improve secondary electron emission which are beneficial for Scanning Electron Microscopy.
The Cathode target material is commonly Gold. However, to achieve finer grain size, and thinner continuous coatings, it is advantageous to use cathode target materials such as Chromium. To achieve sputtering with this target material requires vacuums somewhat better than those achievable with a Rotary Vacuum Pump.
The EMS 575x uses a 'Turbo' pump, backed up by a Rotary Vacuum pump, the complete pumping sequence being under automatic control, and the vacuum on the order of 1 x 10-3 mbar.
The system employs a Magnetron Target assembly, fitted with a 54mm (Dia.) quick change target. A rotating specimen table is employed to ensure that these ultra thin films are evenly deposited onto the specimen.The system employs a Magnetron Target assembly, fitted with a 54mm (Dia.) quick change target.
The sputtering parameters can be pre-set including gas bleed needle valve which has electromagnetic valve back-up. The vacuum can be adjusted to suit conditions for Chromium or Gold targets, and has a dual range Timer to allow for a range of sputtering times. The system has peltier cooling built in giving improved sputtering performance. The EMS 575T is the exact same as the EMS 575X however, it has two heads and the stage is arranged such that the sample can be coated with one material, then another without breaking the vacuum.
FEATURES
- Fully automatic control
- Built in multi specimen holder
- Built in rotary and tilt stage
- Built-in Penning head and gauge
- Ultra high resolution (Less than 0.5nm chromium grain size)
- Thin film deposition (Typically 5nm)
- Rotating and tilting specimen table
- Turbo molecular pumping system
- Modular control electronics
- Clean line design
- Polycarbonate safety shield
- Peltier cooled sputter head
Specifications
| Instrument Case | 450mm(W) x 350mm(D) x 175mm(H) |
| Work Chamber | Borosilicate Glass: 165mm(Dia.) x 125mm(H) |
| Plus Stainless Steel Base | 110mm(Dia.) x 115mm(H) |
| Weight | 42Kg |
| Target | 54mm(Dia.) x 0.2mm(Thick) (Chromium fitted as standard) |
| Specimen stage | 60mm(Dia.) Rotating Table at 60 r.p.m. with tilt facility |
| Vacuum Gauge Range (Penning) | ATM to 1x10-7 mbar |
| Operating Vacuum | 1x10-3 mbar to 1x10-4 mbar |
| Deposition Rate | 0-175mA |
| Sputter Timer | 0-4 minutes |
| Power Supply | 1000v at 100 ma, 100 watts |
| Plasma Voltage | 150v mean dc at 100ma, 15 watts max rating |
| Deposition Rate | 30nm/min at 100ma |
| Turbomolecular Pump | 60 litres/Second (Ultimate vacuum 1x10-8 mbar) |
| Supply | 115 volts 60Hz (12 amp Max incl pump) 230 volts 50Hz (6 amp Max incl pump) |
| Services | Argon Nominal 4 psi |
| Vacuum Pump (Recommended) | Complete with vacuum hose and oil mist filter 85L/Min |
| Size | 470mm(L)x150mm(W)x250mm(H) |
| Weight | 20Kg |
Ordering Information
| 91110 | EMS 575X Sputter Coater complete with Target | POR | Request Quote |
| 91110-TH | EMS 575T Twin Head Sputter Coater complete with Target | POR | Request Quote |
| 91005 | Rotary Vacuum Pump Targets 54mm(Dia.) x 0.2mm(Thick) fitted inclusive as standard | $2,306.00 | Add to Cart |
| 92045 | EMS 50 Water Chiller | POR | Request Quote |
Replacement Targets
| 91010 | Gold Target | 750.00 | Add to Cart |
| 91011 | Gold/Palladium Target | 750.00 | Add to Cart |
| 91012 | Platinum Target | 750.00 | Add to Cart |
| Chromium Target | |||
| Tungsten Target |
Optional Accessories
| 91006 | EMS 150 Film Thickness Monitor | POR | Request Quote |
| 91048 | EMS 140 Cold Trap | POR | Request Quote |
| 92035 | EMS 180 Heating Stage | POR | Request Quote |
EMS 650 Large Sample Coater
and EMS 650T Turbo Large Sample Coater
SPUTTER COATING
The EMS 650 system employs Magnetron Target Assemblies which enhances the efficiency of the process using Low Voltages, and giving a Fine Grain, Cool Sputtering, without the need to cool the target or the specimen stage.
There are three such target assemblies in the EMS 650, positioned to give coating over a large diameter which, together with a rotating sample table, ensures even depositions. This method allows standard targets to be utilized, and avoids the necessity of special large profiled targets.
This triple-target system is particularly useful in the Semiconductor Wafer Industry.
The Instrument is fitted with three 60mm diameter and 0.1mm thick gold (or Customer choice) quick change targets, giving optimum consumable cost performance
.The integrated instrument panel and plug-in electronics maximize 'up-time' and, with user friendly designs, ensure satisfactory multi-user discipline.
The sputtering parameters can be pre-set, including the gas bleed needle valve which has electromagnetic valve back-up which, together with Automatic Control, gives defined and repeatable film thickness depositions.
The sputtering head is interlocked, and the system can easily accommodate the EMS 250 Carbon Coating Attachment.
The independent vacuum pump is controlled by the instrument throughout the fully automatic coating cycle.
The EMS 650T is the exact same as the EMS 650 with the addition of it having a turbo pump pumping at 60L/sec for higher and cleaner vacuum.
Features
- Fully automatic control
- Low energy 'cool' system (Order of 6 Watts for cycle of 2 mins is 720 joules)
- Low voltage sputtering (Order of 100V mean DC temperature increase less than 2°C/minute)
- High resolution fine coating (Order of 2nm Gold Grain)
- Precise reproducible coatings
- Even thickness deposition (Typically 20nm or 200 Angstroms for SEM work)
- Modular control electronics
- Clean line design
- Rotating specimen stage 155mm (Dia) (Coating to 205mm Dia.)
- Triple target sputtering (3 x 60mm (Dia.) Targets)
- Polycarbonate safety shield
Specifications
| Instrument Case | 450mm(W) x 350mm(D) x 175mm(H) |
| Work Chamber | Borosilicate Glass: 225mm(Dia.) x 125mm(H) |
| Weight | 24Kg |
| Targets | Three x 60mm Dia.x0.1mm thick |
| Rotating Specimen Stage | 155mm Dia. Adjustable Height spacing to target 40 to 50mm |
| Vacuum Gauge Range | ATM 1x10-2 mbar |
| Deposition Range | 0-100mA |
| Deposition Rate | 0-20nm/minute |
| Sputter Timer | 0-4 minutes |
| Supply | 115 volts 60 Hz (16 amp Max incl pump) 230 volts 50Hz (8 amp Max incl pump) |
| Services | Argon Nominal 4 psi |
| Vacuum Pump (Recommended) | Complete with vacuum hose and oil mist filter 135L/Min |
| Size | 470mm(L) x 150mm(W) x 250mm(H) |
| Weight | 23Kg |
Ordering Information
| 91020 | EMS 650 Sputter Coater complete with Targets Three x 60mm Dia. x 0.1mm thick fitted inclusive as standard |
POR | Request Quote |
| 91020T | EMS 650T Sputter Coater complete with Targets | POR | Request Quote |
| 91025 | Rotary Vacuum Pump | $2,523.00 | Add to Cart |
Replacement Targets
(Recommended change as set of three)
| 91030 | Gold Targets (x3) | $2,000.00 | Add to Cart |
| 91031 | Gold/Palladium Targets (x3) | $2,000.00 | Add to Cart |
| 91032 | Platinum Targets (x3) | $2,000.00 | Add to Cart |
Replacement Parts
| 91033 | Glass Cylinder 225mm (8") | $650.00 | Add to Cart | |
| 91034 | "L" Gaskets to suite 225mm (8") cylinder | 1 pair | $400.00 | Add to Cart |
Optional Accessories
| 91042 | EMS 125 Etch Facility | POR | Request Quote |
| 91006 | EMS 150 Film Thickness Monitor | POR | Request Quote |
| 92030 | EMS 175 Oscillating Stage | POR | Request Quote |
| 92035 | EMS 180 Heating Stage | POR | Request Quote |
| 91040 | EMS 250 Carbon Coating Attachment | POR | Request Quote |
EMS 675 High Resolution, Large Sample Coater
A complete 8 inch (200mm) wafers can be coated in The EMS675X Sputtering Coater System. The base system with twin gear rotating sample stage gives a progressive elliptical rotation for even sputtering deposition.
The EMS675X Coating System employs a magnetron target assembly which enhances the efficiency of the Sputtering process using low voltages, giving a thin and fine grain coating.
There are three such target assemblies in the EMS675X, positioned to give coating over a large diameter which, together with a rotating sample table, ensures even depositions. This method allows standard targets to be utilized, and avoids the necessity of special large profile targets.
The multi-target system is particularly useful in the semi-conductor wafer industry. It has a turbo molecular pump backed by a Rotary Vacuum Pump.
The integrated instrument panel and plug-in electronics maximize 'up-time' and, with user-friendly designs, ensures satisfactory multi-user discipline.
The sputtering parameters can be pre-set, including the gas bleed needle valve, which has electromagnetic valve back-up.
The independent Vacuum Pump is controlled by the Instrument throughout the fully automatic coating cycle. It can be used to Sputter Coat targets such as Gold, and also targets that may need pre-cleaning, or the removal of oxide layers, such as Chromium.
A shutter assembly is fitted as standard, which allows a Sputter Cleaning and the Sputter Cycle to be carried out while maintaining the vacuum.
Ordering Information
| 91026 | EMS675X Turbo Sputter Coater complete with Three targets each | each | POR | Request Quote |
| 91025 | Rotary Vacuum Pump | each | $2,523.00 | Add to Cart |
Replacement Targets: (Recommended change as set of 3)
| 91030 | Gold Targets (x3) | each | $2,000.00 | Add to Cart |
| 91031 | Gold Palladium Targets(x3) | each | $2,000.00 | Add to Cart |
| 91032 | Platinum Targets(x3) | each | $2,000.00 | Add to Cart |
| Chromium Targets (x3) | each | POR | ||
| Tungsten Targets (x3) | each | POR |
Features:
- Equipped with three sputter targets
- Turbo molecular pumping system
- Fully Automatic Control
- Peltier cooled sputter head
- Fine Coating (Order of 0.5nm Cr Grain Size)
- Special Rotating Stage with full Tilt Facility fitted as standard
- Thin Film Deposition (typically 5nm)
- 300mm Diameter Chamber
- Dual sputter head available as an option
Benefits:
- Allows coating of large samples such as 8” wafers
- Allows sputtering of fine grain oxidizing metals such as Cr or Ir
- Easy to operate
- No cooling water required
- Ultra high resolution reproducible coatings
- Fully adaptable to a wide range of specimens
- Repeatable film thickness depositions
- Easy loading and unloading of samples such as 8” wafers
Specifications of EMS675X Sputtering Coater System:
| Instrument Case | 450mm W x 500mm D x 300mm H (Overall height of unit 630mm) |
| Work Chamber | Borosilicate Glass 300mm Dia. x 20mm H |
| Safety Shield | Polycarbonate |
| Weight | 42Kg |
| Targets | Three x 54mm Dia. x 0.3mm Thick Chromium fitted as standard |
| Rotating Specimen Stage | Adjustable for 6 to 8 inch Wafers, Height spacing to target 60mm |
| Vacuum Gauge | Atmos. - 1 x 10-5 mbar |
| Deposition | 0-450mA |
| Deposition Rate | 0-15nm/minute |
| Sputter Timer | 0-4 minutes |
| Supply | 230 Volts 50Hz (8 Amp Max including pump) 115 Volts 60Hz (16 Amp Max including pump) |
| Services | Argon - Nominal 10 psi |
| Nitrogen | Nominal 10 psi (Argon may be used as common gas) |
| Rotary Backing Pump | Two Stage Vacuum Pump No.2, 35L/Min complete with Vacuum Hose and Oil Mist Filter. 2m3/ |
Replacement Parts
| 91033 | Glass Cylinder 225mm | each | $650.00 | Add to Cart |
| 91034 | L Gaskets (x2) | each | $400.00 | Add to Cart |
Optional Accessories
| 91042 | EMS 125 Etch Facility | each | POR | Request Quote |
| 91006 | EMS 150 Film Thickness Monitor | each | POR | Request Quote |
| 92030 | EMS 175 Oscillating Stage | each | POR | Request Quote |
| 92035 | EMS 180 Heating Stage | each | POR | Request Quote |
| 91040 | EMS 250 Carbon Coating Attachment | each | POR | Request Quote |
EMS
3000 Large Sample, High Resolution Sequential Sputter Coater
The EMS3000 Sputtering Coater System can coat complete 12 inch (300mm) wafers. Three sequential coatings can be achieved without breaking vacuum, offering multi- target sputtering.
This high vacuum, high resolution coating system gives fine and precise, reproducible coatings.
There are three Magnetron target assemblies in the EMS3000, positioned to give coating over a large diameter which, together with a rotating sample table, ensures even depositions. This method allows standard targets to be utilized, and avoids the necessity of special large profile targets.
The target system is particularly useful in the semi-conductor wafer industry. It has a turbo molecular pump backed by a Rotary Vacuum Pump.
The integrated instrument panel and plug-in electronics, maximize 'uptime' and, with user friendly designs, ensures satisfactory multi-user discipline.
The sputtering parameters can be pre-set, including the gas bleed needle valve, which has electromagnetic valve back-up.
The independent Vacuum Pump is controlled by the Instrument throughout the fully automatic coating cycle. It can be used to Sputter Coat targets such as Gold, and also targets that may need pre-cleaning, or the removal of oxide layers, such as Chromium.
A shutter assembly is fitted as standard, which allows a Sputter Cleaning and the Sputter Cycle to be carried out while maintaining the vacuum.
Features
- Modular control electronics
- Clean line design
- Rotating Specimen Stage
- Multi- Target Sputtering (With Sputter Cleaning Shutter Assembly)
- LCD Status/Data Entry Display
- Customer menu input allows up to 10 stored protocols
- LCD Conditions Display (Vacuum, Time and Current)
- Active Vacuum Gauge Head (giving full Vacuum operating range)
- Turbo Molecular Drag Pump with full ISO 100 Flange, (larger pump option) 240 L/sec
- Fast Cycle time fully automatic including purging - 15 minutes
- Peltier Cooled Targets - no water requirements
- Three sequential coatings without breaking vacuum.
Specifications of the EMS3000 Sputtering System
| Instrument Case | 450mm W x 500mm D x 300mm H (Overall height of unit 650mm) |
| Work Chamber | Stainless Steel 300mm Dia. x 200mm H (With viewing Window) |
| Weight | 55Kg |
| Targets | Three x 54mm Dia. x 0.3mm Thick Chromium as Standard (optional range of targets available eg Gold, Platinum, Gold/Palladium) |
| Rotating Specimen Stage | Adjustable for 6 to 12 inch Wafers, Height spacing to target 60mm |
| Vacuum Gauge | Atmos. - 1 x 10-5 mbar |
| Deposition | 0-750mA |
| Deposition Rate | 0-10 nm/minute |
| Sputter Timer | 0-4 minutes |
| Supply | 230 Volts 50Hz (10 Amp max. including pump) 115 Volts 60Hz (20 Amp max. including pump) |
| Services | Argon - Nominal 10 psi |
| Nitrogen | Nominal 10 psi (Argon may be used as common gas) |
| Rotary Backing Pump | Two Stage Vacuum Pump No5, 85L/Min complete with Vacuum Hose and Oil Mist Filter. 8m3/Hr. |
Ordering Information
| 93179 | EMS3000 Sequential Turbo High Resolution Coater | each | POR | Request Quote |
| 91005 | Vacuum Pump | each | $2,306.00 | Add to cart |
