Large Chamber Sputter Coaters

Innovative and versatile Sputter Coaters and Carbon Evaporator for all Microscopy Applications: SEM, high resolution FESEM and TEM

Buy a new unit today and get a $500 credit towards the purchase of any accessories we offer.

EMS300R T Triple Target, Large Chamber, Rotary-Pumped Sputter Coater

Innovative and versatile Sputter Coater and Carbon Evaporator for SEM Applications

Quick Overview

The EMS300R T is a large chamber, rotary-pumped coating system ideally suited for sputtering a single large diameter specimen (e.g. a wafer) up to 8”/203 mm or smaller, multiple specimens over a similar diameter.

The EMS300R T is fitted with three individual sputtering heads to ensure even deposition on a range of specimen types. The system is designed to sputter non-oxidizing (noble) metals, for example gold (Au), gold/palladium (Au/Pd) and platinum (Pt). It is fitted with three individual sputtering heads to ensure even sputtering deposition over a large diameter. Gold targets are fitted as standard.

Note: for sputtering both non-oxidizing and oxidizing metals please see the EMS300T T Large Chamber Turbo-Pumped sputter coater. For sequential sputtering of two different oxidizing or non-oxidizing metals please see the EMS300T D Large Chamber, Turbo-Pumped dual head sputter coater.

Key Features

• Large area sputter coating – up to 8”/203 mm diameter
• Triple sputtering head – ensures even coating deposition of large specimens
• Single target selection – for economic coating of small specimens
• Sputtering of a range of non-oxidising (noble) metals, such as gold (Au), platinum (Pt) and silver (Ag). For oxidising metals see Q300T T and Q300T D
• Precise thickness control using the film thickness monitor option
• Fully automatic touch-screen control – rapid data input, simple operation
• Multiple, customer-defined coating schedules can be stored – ideal for multi-user laboratories
• Coat logging – details of the last 100 coatings available on screen
• Automatic vacuum control – can be pre-programmed to suit the process and material; no needle valve to adjust
  Easy-to-change, drop-in style specimen stages (rotation stage as standard)
• Vacuum shut-down option – leaves the process chamber under vacuum when not in use giving improved vacuum performance
• Thick film capabilities – up to 60 minutes sputtering time without breaking vacuum
• Ergonomic one-piece moulded case – allowing easy maintenance and service access
• Ethernet with local FTP server connection - simple programmer updates
• Power factor correction - complies with the current legislation (CE Certification), efficient use of power means reduced running costs
• Three-year warranty

Product Description

Ideal for sputter coating large specimens for SEM

The EMS300R T is suited for sputtering noble metals, such a gold (Au) and platinum (Pt) for the preparation of specimens for scanning electron microscopy (SEM).

Triple sputtering head

The EMS300R T is fitted with three individual sputtering heads to ensure even deposition of individual large specimens or multiple smaller specimens. Please note that it not possible to sequentially sputter three different sputtering metals from each sputtering head – for sequential coating please see EMS300T D dual head coater.

For economical coating of small specimens “single target” mode can be selected.

Molded case with color touch screen

The EMS300R T is presented in a custom molded, one-piece case, allowing easy servicing access. The color touch-screen allows multiple users to input and store coating ‘recipes’. The case houses all the working components, with an automatic bleed control valve that ensures optimum vacuum conditions during sputtering.

The vacuum chamber has an internal diameter of 283 mm/12” and comes with an integral implosion guard. The Q300R T also includes ‘vacuum shutdown’, which enhances vacuum performance by allowing the chamber vacuum to be maintained when the system is not in use.

A variable speed rotary specimen stage is fitted as standard for 8”/203 mm and 6”/152 mm wafers, with other stages available as options, please see the Options and Accessories section below.

Rapid data entry

At the operational heart of the EMS300R T is a simple color touch screen, which allows even the most inexperienced or occasional operator to rapidly enter and store their own process data. To further aid ease of use, a number of typical sputtering and carbon coating profiles are already stored. For added convenience summaries of the last 100 coatings carried out can be viewed.

Maintenance

The intuitive touch screen interface features maintenance prompts which highlight:

• Time of last clean
• Coating time since last cleaned
• System “on time‟
• Time of last service

Additional Information

Options and Accessories (including details the standard specimen stage)

Specimen stages

The EMS300R T has specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and are height adjustable (except for the rotary planetary stage). Rotation speed is variable between preset limits:

• Flat rotation stage for wafers - for 8”/203 mm and 6”/152 mm wafers (fitted as standard)
• Rotation stage – 50 mm Ø. This stage only rotates - no tilt or height adjustment is possible
• Rotate-tilt stage – 50 mm Ø with height adjustment (target to stage height variable between 30-80 mm). Tilt angle can be pre-set (horizontal to 30 degrees)
• Rotation stage for glass microscope slides

Other options

Extended height chamber – for taller specimens

Film thickness monitor (FTM) - this attachment consists of a controller and quartz crystal oscillator built into the Q300R T and a vacuum feed-through, chamber-mounted crystal holder and quartz crystal. As sputtered or evaporated material is deposited onto the crystal, so its frequency of oscillation is modified. This ‘modification’ is used to measure and control the thickness of material deposited. Note: cannot be used when the coater is operated in “single target” mode.

Specifications

Instrument case	585mm W x 470mm D x 410mm H (total height with coating head open: 650mm)
Weight	36.4kg
Packed dimensions	725mm W x 660mm D x 680mm H (44.8kg)
Work chamber	Borosilicate glass 283mm ID x 127mm H
Safety shield	Integral polyethylene terephthalate (PET) cylinder
Display	145mm x 320mm x 240mm colour graphic thin film transistor (TFT) display
User interface	Intuitive full graphical interface with touch screen buttons, includes features such as a log of the last 100 coatings carried out and reminders for when maintenance is due
Sputter targets	Disc style 57mm Ø with thick depending upon the targets fitted. Three 57 mm Ø x 0.1 mm thick gold (Au) targets (SC502-314A) are fitted as standard.

Vacuum

Rotary pump	50L/m two-stage rotary pump with oil mist filter. Order separately, 91005.
Vacuum measurement	Pirani gauge
Typical ultimate vacuum	2x10-2mbar in a clean system after pre-pumping with dry nitrogen gas
Specimen stage	Flat rotation stage for 200mm/8” and 150mm/6” wafers fitted as standard. Rotation speed is variable between preset options. For alternative stages see Options and Accessories

Processes

Sputtering

0-80mA to a pre-determined thickness (with optional FTM) or by the built-in timer. The maximum sputtering time is 60 minutes (without ‘breaking’ vacuum and with built-in rest periods)

Services and other information

Gases	Argon sputtering process gas, 99.999% Nitrogen venting gas (optional)
Electrical supply	90-250V 50/60Hz 1,400VA including RV3 rotary pump power. 110/240V voltage selectable
Conformity	CE conformity: Power factor correction. Complies with the current legislation (CE Certification) and ensures efficient use of power, which means reduced running costs

Ordering Information

EMS300R T	Large-Chamber-Rotary-Pumped Sputter Coater, fitted with three sputtering heads to ensure even metaldeposition.  Include three  57mm Ø x 0.3mm gold (Au) sputter targets. A flat rotation stage for 8”/203 mm/and 6”/152 mm wafers is fitted as standard	POR	Quote
91005	Rotary pump requirements (needs to be ordered separately) Edwards RV5 90L/s two-stage rotary pump, with vacuum hose, coupling kit and oil mist filter	$2566.00	Add to Cart

Specimen Stages

6400-S	Rotating 50 mm Ø specimen stage with adjustable tilt. The platform has six specimen stub positions for 6.5mm, 10  mm and 15 mm or 1/8" pin stubs. Stage rotation speed is variable between preset limits. No rotation is possible when in single target mode. Target to stage height is variable between 0 mm and 42 mm for the standard stage. When used with the extended height cylinder (optional accessory 10596) the target to stage height would be an additional 87 mm	POR	Quote
6401	50 mm Ø variable height specimen stage with six stub positions for, 6.5 mm 10 mm and 15 mm disc stubs or 1/8" pin stubs. Stage rotation speed is variable between preset limits	POR	Quote
6402	50 mm Ø rotary tilting stage. A rotary planetary style stage with variable tilt angle from horizontal to 30 degrees. The platform has six positions for either 6.5 mm 10 mm and 15 mm disc stubs or 1/8" pin stubs. Rotation speed is variable between preset limits. Note: depending upon specimen height, this stage may require the optional extended height cylinder	POR	Quote
6403	A 90mm Ø specimen stage for glass microscope slides (up to two x 75mm x 25mm slides or a single 75 mm x 50 mm slide). The stage can alternatively accommodate up to six 1/8” SEM pins stub. Stage rotation speed variable between preset limits. Includes a gear box to allow the optional FTM to be used	POR	Quote

Options and accessories

6404	Film thickness monitor (FTM) attachment. Including oscillator, feed-through, quartz crystal holder and one C5460 quartz crystal	POR	Quote
6405	Spare quartz crystal	95.00	Add to cart
6406	Extended height vacuum chamber (214 mm in height - the standard chamber is 127 mm high). For increased source to specimen distance and for coating larger specimens	POR	Quote
6407	Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the Q300R T when bench depth is limited	POR	Quote
6408	A lockable emergency stop (e-stop) switch which can be mounted on top of the system in a position easily accessible for the  operator. It is provided with a key to release the knob after activation. Note: the addition of the e-stop does not inhibit or replace the normal On/Off switch function. The e-stop can be retrofitted to existing systems	POR	Quote
6409	Coating shields. Shields can be fitted to protect large surfaces from coating deposition, easily removable for ease of cleaning	POR	Quote
6410	Two-year spares kit for EMS300R T. Includes: 3 x  57mm Ø x 0.3mm gold (Au) target, standard glass chamber assembly, O-rings etc.	POR	Quote
6411	6” Wafer Specimen Stage: A flat adjustable stage capable of accepting 6” or 101.6 mm wafers	POR	Quote
6412	4” Wafer Stage : A flat 4 ½” 102mm flat, drop in wafer stage which accepts 2, 3, 4 “ Wafers	POR	Quote
6413	Additional Standard Glass Cylinder Assembly	POR	Quote

Sputter targets

The EMS300R T is fitted as standard with three 0.3mm thick gold (Au) targets . Other optional targets are available (three required):

4523	57mm Ø x 0.1mm Gold	POR	Quote
4524	57mm Ø x 0.2mm Gold	POR	Quote
4525	57mm Ø x 0.3mm Gold	POR	Quote
4526	57mm Ø x 0.1mm Gold/Palladium (80/20%)	POR	Quote
4527	57mm Ø x 0.2mm Gold/Palladium (80/20%)	POR	Quote
4528	57mm Ø x 0.3mm Gold/Palladium (80/20%)	POR	Quote
4529	57mm Ø x 0.1mm Platinum	POR	Quote
4530	57mm Ø x 0.2mm Platinum	POR	Quote
4531	57mm Ø x 0.3mm Platinum	POR	Quote
4532	57mm Ø x 0.1mm Nickel	POR	Quote
4533	57mm Ø x 0.1mm Silver	POR	Quote
4534	57mm Ø x 0.1mm Palladium	POR	Quote
4535	57mm Ø x 0.1mm Copper	POR	Quote
4536	57mm Ø x 0.1mm Platinum/Palladium (80/20%)	POR	Quote
4537	57mm Ø x 0.3mm Platinum/Palladium (80/20%)	POR	Quote

Buy a new unit today and get a $500 credit towards the purchase of any accessories we offer.

EMS 300T T Triple Target, Large Chamber, Turbo-Pumped Sputter Coater

Innovative and versatile Sputter Coater and Carbon Evaporator for SEM Applications

Quick Overview

The EMS 300T T is a large chamber, turbomolecular-pumped coating system ideally suited for sputtering a single large diameter specimen up to 8”/203 mm (for example a wafer) or smaller multiple specimens of a similar area.

The EMS 300T T is fitted with three individual sputtering heads to ensure even deposition on a range of specimen types. The system is designed to sputter both oxidising metals e.g. chromium (Cr) and aluminium (Al) and non-oxidising (noble) metals such as gold (Au), gold/palladium (Au/Pd) and platinum (Pt). Chromium targets are fitted as standard.

If the requirement is for sputtering non-oxidising metals only then the EMS300R T large chamber, turbo-pumped sputter coater is the most suitable choice.

Key Features

• Large area sputter coating – up to 8”/203 mm diameter
• Triple sputtering head – ensures even coating deposition of large specimens
• Single target selection – for economic coating of small specimens for SEM
• Fine grain sputtering for advanced high resolution FE-SEM applications
• Coat logging – details of the last 100 coatings available on screen
• High vacuum turbo pumping - allows sputtering of a wide range of oxidising and non-oxidising metals suitable for SEM, high resolution FE-SEM and also for many thin film applications
• Precise thickness control using the film thickness monitor option
• Fully automatic touch-screen control – rapid data input, simple operation
• Multiple, customer-defined coating schedules can be stored – ideal for multi-user laboratories
• Automatic vacuum control – can be pre-programmed to suit the process and material; no needle valve to adjust
• Easy-to-change, drop-in style specimen stages (rotation stage supplied as standard)
• Vacuum shut-down option – leaves the process chamber under vacuum when not in use, giving improved vacuum performance
• Thick film option – up to 60 minutes sputtering time without breaking vacuum
• Ergonomic one-piece moulded case – enables easy maintenance and service access
• Ethernet with local FTP server connection – simple programmer updates
• Power factor correction – complies with the current legislation (CE Certification) – efficient use of power means reduced running costs
• Three-year warranty

Product Description

Ideal for sputter coating large specimens and thin film applications and SEM / FE-SEM

The EMS300T T is suited for sputtering a range of oxidising and non-oxidising (noble) metals for thin film applications and scanning electron microscopy (SEM). The range of target materials available is extensive and detailed in the Ordering Information section below.

High vacuum turbo molecular pumping

The EMS300T T is fitted with an internally mounted 70L/sec turbo-molecular pump, backed by a 50L/m two-stage rotary pump (which needs to be ordered separately). A Pirani vacuum measurement gauge (range: 1000 mbar to 5 x 10-4 mbar) is included, but a full range gauge (1000 mbar to 5 x 10-9 mbar) is available as an option.

Typical ultimate vacuum of around 5 x 10-5 mbar can be expected in a clean system after pre-pumping with dry nitrogen gas.

Triple sputtering head – for an even, consistent coating

The EMS300T T is fitted with three individual sputtering heads to ensure even deposition of individual large specimens or multiple specimens. Please note that it not possible to sequentially sputter three different sputtering metals from each sputtering head, for sequential coating of two metals then the EMS300T D is a more suitable option. For economical coating of small specimens such a SEM stubs then “single target” mode can be selected.

Moulded case with colour touch-screen

The EMS 300T T is presented in a custom moulded, one-piece case allowing easy servicing access. The colour touch-screen enables multiple users to input and store coating ‘recipes’. The case houses all the working components and includes an automatic bleed control that ensures optimum vacuum conditions during sputtering.

The vacuum chamber has an internal diameter of 283 mm/12” and comes with an integral implosion guard. The vacuum shutdown option can enhance vacuum performance by allowing the chamber vacuum to be maintained when the system is not in use.

A variable speed rotary specimen stage is fitted as standard and accommodates 8”/203 mm and 6”/152 mm wafers. Other stages are available as options for this coater, please see the Options and Accessories section for more information.

Rapid data entry

At the operational heart of the EMS300T T is a simple colour touch-screen, which allows even the most inexperienced or occasional operator to rapidly enter and store their own process data. To further aid ease of use, a number of typical sputter coating profiles are already stored. For added convenience summaries of the last 100 coatings carried out can be viewed.

Maintenance

The intuitive touch screen interface features maintenance prompts which highlight:

• Time of last clean
• Coating time since last cleaned
• System “on time‟
• Time of last service

Additional Information

Options and Accessories (including details the standard specimen stage)

Specimen stages

The EMS 300T T has specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and are height adjustable (except the rotary planetary stage). Rotation speed is variable between preset limits:

• Flat rotation stage for wafers - for 8”/203 mm and 6”/152 mm wafers (fitted as standard)
• Rotation stage – 50 mm Ø. This stage only rotates - no tilt or height adjustment is possible
• Rotate-tilt stage – 50 mm Ø with height adjustment (target to stage height variable between 30-80 mm). Tilt angle can be pre-set (horizontal to 30 degrees)
• Rotation stage for glass microscope slides

Other options

Extended height chamber – for taller specimens

Film thickness monitor (FTM) - the optional FTM attachment consists of a controller and quartz crystal oscillator built into the EMS300TT, a vacuum feed-through, chamber-mounted crystal holder and quartz crystal. Note: the FTM cannot be used when the coater is operated in “single target” mode.

Specifications

Instrument case	585 mm W x 470 mm D x 410 mm H (total height with coating head open -710 mm)
Weight	36.4kg
Packed dimensions	725 mm W x 660 mm D x 680 mm H (44.8kg)
Work chamber	Borosilicate glass 283 mm ID x 127 mm H
Safety shield	Integral polyethylene terephthalate (PET) cylinder
Display	145 mm x 320 mm x 240 mm colour graphic thin film transistor (TFT) display
User interface	Intuitive full graphical interface with touch-screen menus and buttons, includes features such as a log of the last 100 coatings carried out and reminders for when maintenance is due
Sputter target	Disc style 57 mm Ø with thickness depending upon the targets fitted. Three 57 mm Ø x 0.3 mm thick chromium (Cr) targets (TK8845) are fitted as standard.

Vacuum

High vacuum pumping	Internally-mounted, 70L/s air-cooled turbo-molecular pump
Rotary pump	50L/m two-stage rotary pump with oil mist filter.
Vacuum measurement	Pirani gauge
Typical ultimate vacuum	5x10-5mbar in a clean system after pre-pumping with dry nitrogen gas
Specimen stage	A flat rotation stage for 8”/203 mm and 6”/152 mm wafers fitted as standard. Rotation speed is variable between preset limits. For alternative stages see Options and Accessories

Processes

Sputtering

0-80 mA to a pre-determined thickness (with optional FTM) or by the built-in timer. The maximum sputtering time is 60 minutes (without breaking vacuum and with built-in rest periods)

Services and other information

Gases	Argon sputtering process gas, 99.999% Nitrogen venting gas (optional)
Electrical supply	90-250V 50/60Hz 1,400VA including RV3 rotary pump power. 110/240V voltage selectable
Conformity	CE conformity: Power factor correction. Complies with the current legislation (CE Certification) and ensures efficient use of power, which means reduced running costs

Ordering Information

Buy a new unit today and get a $500 credit towards the purchase of any accessories we offer.

EMS 300T T

Large-Chamber-Turbo-Pumped Sputter Coater, fitted with three sputtering heads to ensure even metal deposition. Fitted with three 57mm Ø x 0.3 mm chromium (Cr) sputtering targets as standard (TK8845). A flat rotation stage (10826) for 8”/203 mm and 6”/152 mm wafers is also supplied.

POR

Quote

Rotary pump requirements (needs to be ordered separately)

91003	Edwards RV3 50L/s two-stage rotary pump, with vacuum hose, coupling kit and oil mist filter	$2324.00	Add to Cart
6548	XDS 5 Scroll Pump	POR	Quote
6550	Diaphragm pump. A “dry” alternative to the standard 91003 oil-based rotary pump complete with vacuum hose, coupling kit and oil mist filter	POR	Quote

Specimen stages

6551	Rotating 50 mm Ø specimen stage with adjustable tilt. The platform has six specimen stub positions for 15 mm, 10 mm, 6.5 mm or 1/8" pin stubs. Stage rotation speed is variable between preset limits. No rotation when in single target mode. Target to stage height is variable between zero and 42 mm for the standard stage. When used with the extended height cylinder (optional accessory 10596) the target to stage height would be an additional 87 mm	POR	Quote
6552	50 mm Ø variable height specimen stage with six stub positions for 15 mm, 10 mm, 6.5 mm disc stubs or 1/8" pin stubs. Stage rotation speed variable between preset limits	POR	Quote
6553	50 mm Ø rotary tilting stage. A rotary planetary style stage with variable tilt angle from horizontal to 30 degrees. The platform has six positions for either, 6.5 mm, 10 mm, 15 mm disc stubs, or 1/8" pin stubs. Rotation speed is variable between preset limits.  Note: depending upon specimen height, this stage may require the optional extended height cylinder	POR	Quote
6554	A 90 mm Ø specimen stage for glass microscope slides (up to two 75 mm x 25 mm slides or a single 75 mm x 50 mm slide). The stage can alternatively accommodate up to six 1/8” SEM pins stub. Stage rotation speed is variable between preset limits. Includes gear box to allow optional FTM to be used.	POR	Quote
6547	6” Wafer Specimen Stage: A flat adjustable stage capable of accepting 6” or 101.6 mm wafers	POR	Quote
6549	A 4” 102mm flat drop-in-wafer stage which accepts 2”, 3 “, and 4” wafers	POR	Quote

Options and accessories

6555	Film thickness monitor (FTM) attachment. Including oscillator, feed-through, quartz crystal holder and one quartz crystal	POR	Quote
6556	Spare quartz crystal	POR	Quote
6557	Extended height vacuum chamber (214 mm in height - the standard chamber is 127 mm high). For increased source to specimen distance and for coating large specimens	POR	Quote
6558	A lockable emergency stop (e-stop) switch which can be mounted on top of the system in a position easily accessible for the operator. It is provided with a key to release the knob after activation. Note: the addition of the e-stop does not inhibit or replace the normal On/Off switch function. The e-stop can be retrofitted to existing systems	POR	Quote
6559	Coating shields. Shields can be fitted to protect large surfaces from coating deposition - easily removable for ease of cleaning	POR	Quote
6560	Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the Q300T T when bench depth is limited	POR	Quote
6561	Full range, active vacuum gauge capable of measurement over the range of 1000 mbar to 5 x 10-9 mbar. Typical ultimate vacuum of system is 5 x 10-5 mbar. Note: gauge must be factory fitted	POR	Quote
6562	Spares kit, including: spare standard glass cylinder, three TK8845 chromium sputtering targets, vacuum tubing with coupling insert, argon gas tubing, three sputter head magnets, rotary pump oil mist filter and fuses	POR	Quote

Sputter targets

NB: The EMS300T T is fitted as standard with three 0.3 mm chromium (Cr) targets (TK8845). Other optional targets are available (three required):

3410	57mm Ø x 0.1mm Gold	POR	Quote
3411	57mm Ø x 0.1mm Gold/Palladium (80/20)	POR	Quote
3412	57mm Ø x 0.1mm Platinum	POR	Quote
3413	57mm Ø x 0.1mm Nickel	POR	Quote
3414	57mm Ø x 0.1mm Silver	POR	Quote
3415	57mm Ø x 0.1mm Palladium	POR	Quote
3416	57mm Ø x 0.1mm Copper	POR	Quote
3417	57mm Ø x 0.3mm Chromium	POR	Quote
3418	57mm Ø x 0.5mm Tungsten	POR	Quote
3419	57mm Ø x 1.5mm Chromium	POR	Quote
3420	57mm Ø x 0.2mm Tungsten	POR	Quote
3421	54mm Ø x 1.5mm Carbon	POR	Quote
3422	57mm Ø x 0.1mm Aluminium	POR	Quote
3423	57mm Ø x 0.1mm Platinum/Palladium (80/20)	POR	Quote
3424	57mm Ø x 1.5mm Titanium	POR	Quote
3425	57mm Ø x 0.3mm Platinum/Palladium (80/20)	POR	Quote
3426	57mm Ø x 0.3mm Gold	POR	Quote
3427	57mm Ø x 0.3mm Gold/Palladium (80/20)	POR	Quote
3428	57mm Ø x 0.3mm Platinum	POR	Quote
3429	57mm Ø x 0.5mm Titanium	POR	Quote
3430	57mm Ø x 0.1mm Iron	POR	Quote
3431	57mm Ø x 0.3mm Iridium	POR	Quote
3432	57mm Ø x 0.1mm Cobalt	POR	Quote
3433	57mm Ø x 0.1mm Tin	POR	Quote
3434	57mm Ø x 0.1mm Molybdenum	POR	Quote
3435	57mm Ø x 0.3mm Magnesium	POR	Quote
3436	57mm Ø x 0.1mm Tantalum	POR	Quote
3437	57mm Ø x 3mm Indium Tin Oxide (90/10)	POR	Quote

EMS 975 Large Chamber Turbo Evaporator & EMS 975S for Semiconductor Wafer Coating

The EMS 975 Turbo Evaporator is a multiple application system to enable a range of preparation techniques to be applied with the flexibility and module expansion capability to develop new methods and prepare new specimens.

The EMS 975 allows for carbon evaporation, metal evaporation from both baskets and crucibles and sputter coating option. A range of techniques can be practiced including carbon support films and replicas for TEM, carbon/metal evaporation, low angle shadowing and sequential layer coating using dual source evaporation and the sputter option can be used for a range of target materials.

The system flexibility is further enhanced by the use of a microcontroller, which readily allows the customer access to a range of options, but readily ‘defaults’ to optimum operating conditions, allowing both fully automatic and manual override as required. The unique loading rack out drawer system gives the user easy sample access with good sample size and the hinged lid assembly makes any other areas of the system readily accessible.

The unit has a turbo pump, externally mounted for convenience and easy exchange, and is backed up by a Rotary Vacuum Pump. The complete pumping sequence is under fully automatic control, achieving a high vacuum for evaporation.

The unit is bench mounted, with easy to use controls, and cannot be damaged by inadvertent use.

The EMS-975S is based on the EMS-975, however it has a special load lock door which allows the entry of 8” wafers with carbon coating, or other samples up to 140mm x 140mm square.

Features

• Turbomolecular Pump.
• Automatic pumping sequence.
• Clean vacuum.
• Variable outgas control.
• Evaporation pulse button.
• Unique “anti stick” carbon rod gun evaporation assembly (patent pending).
• Rack out drawer sample loading system.
• Rotating plate specimen table with external accurate tilt control (option).
• Large sample capacity,150mm (6") using drawer with up 200mm (8") for top loading.
• Sample holders range of options, including grid holders, stub holders.
• Carbon and Carbon/Platinum evaporation.
• Full range vacuum measuring system.
• Fast pumping cycle.
• Protective Polycarbonate Implosion Shield.
• Selectable evaporation supplies giving x 4 evaporation settings.
• Restricted or full vent control to avoid disturbances of samples.
• Microcontroller with LCD displays of status and customer data entry for control of systems.
• Modular electronics.
• Bench mounted unit.
• Sputter coating (option) for range of metal targets.
• Film thickness measurement for carbon and metal depositions.

Specifications

Dimensions and Weight	450mm (W) x 500mm (D) x 300mm (H). 65kg
Work Chamber	Borosilicate Glass 250mm (Dia.) x 300mm (H) with hinged top plate (can accommodate samples to 200mm) (8”) in Dia.
Implosion Guard	Polycarbonate - readily removable for maintenance
Carbon source	Adjustable height with tilt control of 0-200°. Uses 6.15mm Ø carbon rods (source for 3.05mm Ø carbon rods can be fitted - please specify at time of ordering)
Metal source	Adjustable height with tilt control 0-200°. Supplied with pack of 10 B5230 tungsten specimen baskets
Specimen Stage	With tilt facility 0-45°
Vacuum Gauge range	Atm to 1 x 10-7-7 mbar
Operating Vacuum	Towards 1 x10-5 mbar, typically achieved within 15 minutes
Low voltage evaporation supply	Pulsed or variable control. Selectable: 0-5V-15V-25V, out-gas current: 0-25A
Services	Nitrogen gas (if used for venting). Argon gas (if the optional sputtering attachment is fitted)
Vacuum pumping	100L/s turbomolecular pump. Requires a 50L/m ‘backing’ rotary pump with oil mist filter
Electrical supply	230V/50Hz (8A max including pump), 115V/60Hz (16A max including pump)
Supplied with	Accessory kit including: carbon rods (6.15mm x 100mm), evaporation filaments, manual rod shaper and operating manual

Ordering Information

91090-C	EMS 975 Large Chamber Turbo Evaporator complete with carbon source	POR	Quote
91090-S	EMS 975S Turbo Evaporator for Semi Conductor Wafer Coating	POR	Quote
91005	Rotary Vacuum Pump needed to backup the turbo pump	2566.00	Add to cart

Replacement Source

91077

Carbon Rods (6.15mm Dia.), 12/pack

59.00

Add to Cart

Replacement Parts

91033	Glass Cylinder	650.00	Add to Cart
91034	"L" Gaskets	400.00	Quote

Optional Accessories

91004-S	EMS 105 Aperture Cleaning Head	POR	Quote
92060	EMS 190 Low Angle Shadowing	POR	Quote

SEM/TEM Carbon Coaters Techniques and Applications

Sputter Coater Principles

Silver as a Removable Coating for Scanning Electron Microscopy

Dual Head Turbo-Pumped Sputter Coater