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arrow14Carbon Turbo Evaporators

EMS 950 Turbo-pumped carbon evaporatorarrow14EMS 950 Turbo Evaporator

What is CARBON EVAPORATION?

The use of Carbon Evaporation is well known in Electron Microscopy for support films and replicas in TEM, and X-Ray Microanalysis and conducting coatings in SEM.

The films are continuous for thicknesses of 2nm (or 20 Angstroms) or more, and free of significant structure.

The most common form of deposition is from resistance heated carbon, or graphite rods, spectrographically pure. The rods are shaped to achieve a high current density at the point of contact of the rods with sufficient temperature being generated to cause the evaporation. At this point, the appearance being that of small, bright, glowing particles of carbon. To achieve the required vacuum condition of 1x10-4 mbar, or better, requires the use of Diffusion or Turbo Molecular Pumps.

The EMS 950 uses a Turbo Pump, backed up by a Rotary Vacuum Pump, the complete pumping sequence being under fully automatic control, and the vacuum somewhat better than 1 x 10-5 mbar. A variable control is available to pre-heat, and outgas the rods, while the use of an instantaneous evaporate switch allows bust evaporation under user control.

The Rotary Specimen Table is adjustable in height, and can facilitate a range of specimens. This is in addition to the special recess to locate standard glass slides, specifically beneficial for 'Asbestos Analysis' methods requiring carbon coatings.

An alternative Head can be fitted for the 'occasional' use of aperture cleaning.

The normal venting is by restriction to avoid specimen disturbance with the system being fully interlocked.

The Turbo pump can be mounted on any axis, and can 'shutdown' safely to atmosphere.

The head is a quick release head and it stays on the unit and has spring loaded release clips at the sides and can readily fit any of the options. (Sputtering, glow discharge, aperture cleaning, ect.).

Features

Specifications

Instrument Case 450mm(W) x 350mm(D) x 175mm(H)
Work Chamber Borosilicate Glass: 165mm(Dia.) x 125mm(H)
Plus Aluminum Base: 110mm(Dia.) x 115mm(H)
Weight 28Kg
Carbon Source Rods 3.2mm (Dia.)
Rotating Specimen Stage 60mm (Dia.)
Rotate and tilt standard
Spacing to Electrodes 130 mm
Vacuum Gauge ATM ­1 x 10-5 mbar
High Vacuum Normal condition indicator
Operating Vacuum 1 x 10-5 mbar
Ammeter Gauge 0-50 Amps
Low Voltage 0-5v-15v-25v
Outgas Current 0-25 Amps
Turbomolecular Pump 60L/Second
Supply 115 volts 60 Hz (12 amp Max incl pump)
230 volts 50 Hz (6 amp Max incl pump)
Vacuum Pump 85L/Min
Complete with vacuum hose and oil mist filter
Size 340mm(L) x 150mm(W) x 250mm(H)
Weight 14Kg

Ordering Information

91070 EMS 950 Turbo Coater complete with carbon sources POR Request Quote
91005 Rotary Vacuum Pump 2,306.00 Add to Cart

Replacement Source

91077 Carbon Rods 6.15mm Dia, 12/pack 59.00 Add to Cart

Replacement Parts

91013 Glass Cylinder 165mm (6") 175.00 Add to Cart
91014 'L' Gasket to suit 165mm (6") cylinder (1 pair) 95.00 Add to Cart

Optional Accessories

94100 EMS 100 Glow Discharge Head POR Request Quote
91004-S EMS 105 Aperture Cleaning Head POR Request Quote
95125 EMS 110 Carbon Fiber Coating Attach. POR Request Quote
91006 EMS 150 Film Thickness Monitor POR Request Quote
92030 EMS 175 Oscillating Stage POR Request Quote
92035 EMS 180 Heating Stage POR Request Quote
91082 EMS 350 Sputter Coating Attach. POR Request Quote
92030 EMS 175 Oscillating Stage POR Request Quote

EMS 975 Large Chamber Turbo Evaporator & EMS 975S for Semionductor Wafer Coatingarrow14EMS 975 Large Chamber Turbo Evaporator & EMS 975S for Semionductor Wafer Coating

Turbo Evaporator and Wafer Coating 

The EMS-975 Turbo Evaporator is a multiple application system to enable a range of preparation techniques to be applied with the flexibility and module expansion capability to develop new methods and prepare new specimens.

It allows for carbon evaporation, metal evaporation from both baskets and crucibles and sputter coating option. A range of techniques can be practiced including carbon support films and replicas for TEM, carbon/metal evaporation, low angle shadowing and sequential layer coating using dual source evaporation and the sputter option can be used for a range of target materials. 

The system flexibility is further enhanced by the use of a microcontroller, which readily allows the customer access to a range of options, but readily 'defaults' to optimum operating conditions, allowing both fully automatic and manual override as required. The unique loading rack out drawer system gives the user easy sample access with good sample size and the hinged lid assembly makes any other areas of the system readily accessible. 

The unit has a turbo pump, externally mounted for convenience and easy exchange, and is backed up by a Rotary Vacuum Pump. The complete pumping sequence is under fully automatic control, achieving a high vacuum for evaporation. 

The unit is bench mounted, with easy to use controls, and cannot be damaged by inadvertent use. 

The EMS 975S is based on the EMS 975, however it has a special load lock door which allows the entry of 8" wafers with carbon coating, or other samples up to 140mm x 140mm square.

Features

Specifications

Instrument Case 450mm(W)x500mm(D) x 300mm(H)
Work chamber Borosilicate Glass: 250mm(Dia.)x300mm(H) with hinged top plate (can accommodate samples to 200mm) (8") in Dia.
Polycarbonate Implosion Guard To suit work chamber readily removable for maintenance
Weight 65kg
Carbon Gun Adjustable height with tilt control 0-20°.
Uses 6.15mm carbon rods
Turbomolecular Pump 100L/ Sec as standard
Optional sizes available
Vacuum Gauges Active Gauge Head: Atm to 1 x 10-7 mbar
Working Vacuum within 15 minutes
Operating Vacuum Into x10-5 mbar range (liquid nitrogen trap option)
Evaporation supply (Pulsed
or variable control)
4 x selectable, low voltage volts a.c.
V, 5V, 15V, 25V @ 25 amps. 7V @ 100 amps.
Specimen Table With tilt facility 1-45°
Rotating Specimen
Table Option
60mm(Dia.) tilling 0-45° with variable speed control 15 rpm to 45 rpm
Sputtering Option
Deposition
0-100mA
Deposition Rate 0-50nm/min. gold (Au)
Standard Target 57mm Au (options Pt, Pt/Pd, Pd, Cr, Ni, Cu, Ag)
Timer (HT Safety Interlocked) 0-4 min.
Services Argon (for sputtering option) - Nominal 4 psi.
Vacuum pump No. 2 pump (2mVhr) Pumping speed oil mist filter vacuum hose (included with instrument)
Supply 115V 60 Hz (16 amp including pump)
230V 50 Hz (8 amp including pump)

Ordering Information

91090 EMS 975 Large Chamber Turbo Evaporator complete with carbon source POR Request Quote
91090-S EMS 975S Turbo Evaporator for Semi Conductor Wafer Coating POR Request Quote
91005 Rotary Vacuum Pump 2306.00 Add to cart

Replacement Source

91077 Carbon Rods (6.15mm Dia.), 12/pack 59.00 Add to Cart

Replacement Parts

91033 Glass Cylinder 650.00 Add to Cart
91034 "L" Gaskets 400.00 Request Quote

Optional Accessories

91004-S EMS 105 Aperture Cleaning Head POR Request Quote
92060 EMS 190 Low Angle Shadowing POR Request Quote
91082 EMS Sputter Coater Attachment POR Request Quote

Plasma Ashers For Ashing, Etching & Cleaning arrow12arrow12

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