Aduro™ HT System

In situ microscopy is a critical need in many areas of materials science, including catalysis, coatings, and novel materials. Until now, no commercially viable solutions have existed that enable real- time, dynamic thermal studies in a fast, versatile, high-resolution and easy-to-use package.

Conventional heating stages for electron microscopy use relatively large furnaces as a heat source. Their slow response times and substantial drift often limits their use for high resolution, in situ heating studies. The Aduro™ heating system for high resolution in situ electron microscopy replaces standard furnaces with microfabricated, semiconductor-based heating devices as specimen supports. These devices use an ultra-thin, conductive ceramic membrane to simultaneously support and heat the sample. This approach provides extremely accurate and well-controlled sample heating with virtually no drift. The low thermal mass of the ceramic membrane also allows for extremely fast response times, up to 1,000,000°C per second to temperatures up to 1200°C.  With excellent stability and true reaction-rate heating, the software controlled Aduro™ heating system enables novel, in situ experiments on any electron microscope including sintering, rapid thermal cycling and lifetime testing, grain growth, phase changes, surface reactions and quenching - all at the high resolution possible.

Application Areas

• Rapid thermal cycling and lifetime testing
• Quality Assurance
• Ultra-high and high temperature studies
• Grain Growth
• Thin films and Coatings
• Quenching
• Nanoparticle catalysts
• Sintering

Important Points

The semiconductor devices replace both the normal TEM grid and the furnace of traditional heating holders.  The semiconductor devices simultaneously support and heat the sample.

The semiconductor devices enable customers to have a disposable furnace which eliminates contamination and makes the holder forward- compatible with future consumables.

For the first time ever, atomic resolution at temperatures up to 1200 deg C is possible.

Features and Benefits

Extremely low thermal mass	»	High stability and low drift, less than 1ms response time
Direct heating of support film	»	Very accurate temperature control of sample
Robust ceramic material	»	Inert, capable of reaching temperatures from RT to 1200°C
MEMS-based design	»	Consumable design eliminates contamination, compatible with virtually any TEM and STEM instrument

Heating System Components:

• Custom TEM holder with 4 electrical leads
• Power supply and cables
• Computer
• Software with perpetual license
• Starter pack of 25 semiconductor-based specimen support devices

Product Specifications

Temperature Range	»	Ambient to >1200°C
Tilt(Alpha)	»	Exact tilt dependent on pole-piece; specimen tip approx. 0.9mm thick
Support device size	»	4.0mm X 5.8mm
Observable Area	»	500 microns X 500 microns
Power Requirements	»	100/220 VAC

Publications from M&M 2008, Albuquerque

"A New Paradigm for Ultra-High-Resolution Imaging at Elevated Temperatures"; L. F. Allard, W. C. Bigelow, D. P. Nackashi, J.  Damiano and S. E. Mick.

"Study of Pd/ZnO Nanocatalysts for Hydrogen Production"; J. Liu, J.  Wang and L. F. Allard.

"In-situ Z-STEM Imaging of Chemical Ordering in FePt Magnetic Nanoparticles"; J.E. Wittig, J. Bentley, L.F.  Allard, M.S. Wellons and C.M. Lukehar.

"In-situ TEM Observations on the Sintering Process of Colloidal Gold Using an Ultra-fast Heating Stage"; M. Briceno, K. Hattar, John Damiano, David Nackashi, I.M. Robertson.

"A MEMS-based Technology Platform for in-situ TEM Heating Studies "; John Damiano, David P. Nackashi, and Stephen E. Mick.

Ordering Information

100010	Single tilt heating holder system for STEM, TEM, (S)TEM	each	POR	Request Quote
100011	Semiconductor heating / support device for Aduro™ heating holder	each	$49.00	Add to Cart