Rotation Stage For 4" Or 6" Wafers

Q300T ES Large Chamber Turbo-Pumped Evaporator/Sputter Coater

The Q300T ES is a large chamber, turbomolecular-pumped coating system ideally suited to metal evaporation onto large diameter specimens up to 6"/152 mm (for example a wafer) or smaller multiple specimens. The Q300T ES also comes with interchangeable sputtering and carbon evaporation inserts to allow a coating radius of up to 4"/102 mm.

Key Features

  • Metal evaporation, carbon evaporation and metal sputtering – in one space saving design
  • Larger area metal evaporation – up to 6"/152 mm
  • Larger area sputter/carbon coating – up to 4"/102 mm diameter
  • High vacuum sputtering – oxidizing and non-oxidizing (noble) metals: suitable for SEM, high resolution FE-SEM and many thin film applications
  • High vacuum carbon coater – ideal for SEM and TEM carbon coating
  • Controlled, ramped carbon rod evaporation – precise control of carbon thickness. Non-sparking process gives superior quality films
  • Up to 60 minutes sputtering time – thick films capabilities
  • Three-Year Warranty
Work2Store™ Expanding Storage RackSputtering insertWork2Store™ Expanding Storage Rack Thermal evaporation insert Work2Store™ Expanding Storage Rack Carbon rod evaporation insert

The Q300T ES is a large chamber, turbomolecular-pumped coating system ideally suited to metal evaporation onto large diameter specimens up to 6"/152 mm (for example a wafer) or smaller multiple specimens. The Q300T ES also comes with interchangeable sputtering and carbon evaporation inserts to allow a coating radius of up to 4"/102 mm.

The sputter coating insert will deposit both oxidizing metals, e.g. chromium and Aluminum and non-oxidizing (noble) metals such as gold and platinum. A chromium (Cr) target is fitted as standard.

The Q300T ES has a full range of optional accessories, including specimen stages and film thickness measurement which means the system can be tailored to the precise requirements of the user.

Thermal evaporation of metals

The Q300T ES allows controlled thermal evaporation of metals onto large substrates (up to 6"/152 mm). For many evaporative processes, tungsten filaments supplied with the system are used. However, some metals require the use of a molybdenum boat, which can also be used for heat-cleaning SEM and TEM apertures.

The evaporation head is normally positioned for downwards evaporation, but for small specimens upward evaporation is possible using two terminal extensions supplied with the system.

Sputter coating for high resolution FE-SEM and thin film applications

The advance design of sputtering head, power supply and system control allows sputtering of both oxidizing and non-oxidizing (noble) metals for thin film applications and for scanning electron microscopy (SEM) coating. The full range of target materials available is extensive and detailed in the Ordering Information section.

For sputtering applications where thick films are required, then the Q300T ES can operate for up to 60 minutes.

High vacuum carbon evaporation for SEM and TEM

The carbon rod evaporation insert allows high quality carbon films to be deposited over a radius of up to 4"/102 mm.

The Q300T ES uses controlled ramped carbon rod evaporation to ensure optimum control of the process and quality of results (with or without the optional film thickness measurement system). In addition the quality of the resulting carbon films is enhanced by the eradication of "sparking" which is a common problem with less advanced coating systems.

Work2Store™ Expanding Storage RackSun and planet-style stage with conductance film thickness monitor
High vacuum turbomolecular pumping and vacuum measurement

The Q300T ES is fitted with an internally mounted 70 L/s turbomolecular pump backed by a 5m3 hr two-stage rotary pump (order separately). A full range vacuum measurement gauge is included. Typically ultimate vacuums of around 5 x 10-5 mbar can be expected in a clean system after pre-pumping with dry nitrogen gas. For details of pumping options, see Ordering Information.

Touch-screen control and stored recipes

At the operational heart of the Q300T ES is a color touch screen which allows users to rapidly enter and store their own process data. A range of typical sputtering and evaporation profiles are pre-installed. The Q300T ES uses an 'Intelligent' recognition system that automatically detects the type of coating insert fitted and "becomes" either an evaporator, carbon coater or sputter coater.

Vacuum chamber and specimen stages

The Q300T ES is presented in a custom-molded, one-piece case allowing easy servicing access. The case houses all the working components and includes an automatic bleed control that ensures optimum vacuum conditions during sputtering.

The vacuum chamber has an internal diameter of 283 mm/11" and comes with an integral safety guard. The vacuum shutdown option enhances vacuum performance by allowing the chamber vacuum to be maintained when the coater is not in use.

A variable speed rotary specimen stage is fitted as standard and accommodates specimens up to 4"/100 mm in diameter. For details of other stages, see Ordering Information.

Pumping Requirement

A suitable rotary vacuum pump is required. The Pfeiffer DUO 6 5m3/hr two-stage rotary vacuum pump (91003) is ideal for this purpose. Dry pumping alternatives are also available. See Ordering Information for more details.

Options and Accessories

Specimen stages and holders

The Q300T ES has additional specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and are height adjustable (except for the rotary planetary stage). Rotation speeds are variable between preset limits.

  • Rotation stage for 4" wafers (supplied with system)
  • Rotation stage for 6" wafers
  • Flat rotation stage for SEM specimen stubs
  • Rotation stage with preset tilt for SEM specimen stubs
  • Rotate-tilt (rotary-planetary style) stage
  • Rotation stage for glass microscope slides
  • Eight-place stage for 25 mm or 30 mm embedded polished specimens
  • "Sun and planets" style rotary stage; Three platforms, each 92 mm Ø
  • Microscope coverslip stage for nine 20 mm x 20 mm coverslips
  • TEM grid holder
Other options
  • Extended height chamber (supplied with the Q300T ES)
  • Standard height chamber
  • Film thickness monitor (FTM)
  • Conductance film monitor (CFM)

Specifications

Dimensions 585 mm W x 470 mm D x 410 mm H, total height with coating head open is 710 mm
Weight 37 kg
Packed dimensions 725 mm W x 660 mm D x 680 mm H (45 kg)
Work chamber Borosilicate glass 283 mm ID x 215 mm H
User interface Intuitive full graphical interface with touch-screen menus and buttons
Sputter target Disc-style 57 mm Ø with thickness depending upon the target fitted. One 0.3 mm thick chromium (Cr) target (3417) is fitted as standard
Pumping Internally-mounted 70 L/s turbomolecular pump
Rotary pump 5m3 hr two-stage rotary pump with oil mist filter. (Order separately: see 91003). Dry pumping option available.
Typical ultimate vacuum 5 x 10-5 mbar in a clean system after pre-pumping with dry nitrogen gas. Measurement using a full range Penning gauge
Specimen stage Stage for 4" wafer supplied as standard. For alternative stages, see Ordering Information
Services and other Information
Gases Argon sputtering process gas, 99.999%. Nitrogen venting gas (optional)
Electrical supply 90-250 V 50/60 Hz 1,400 VA including rotary pump, 110/240 V voltage selectable
SKU: 6547-SP
Pack: Each
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