Glow
Discharge, Etch, Film Thickness, and Sputter and Carbon Coating Attachments
EMS
100 Glow Discharge Unit
Freshly made carbon support films tend to have hydrophobic surfaces which inhibits the spreading of suspensions of particles in negative staining solutions. However, after Glow Discharge treatment with air, the carbon film is made hydrophilic and negatively charged, thus allowing easy spreading of aqueous suspensions. With subsequent magnesium acetate treatment the surface is made hydrophilic and positively charged.
In addition to Glow Discharge treatment using air, other process gases may be used to modify surface properties. For example, if alkylamine is used as a process gas, the carbon film surface will become hydrophilic and positively charged. On the other hand, using methanol as a process gas results in the surface becoming hydrophobic and negatively charged. Such treatments can facilitate the optional absorption of selected biomolecules.
Features
- Polarity of the head can be changed from positive
to negative with respect to earth. - H.T. vacuum interlock.
- Needle valve bleed control.
- Surface treatment and cleaning.
- Safety shield made from polycarbonate
Specifications
| Plasma Voltage | 0-1000V Variable DC @100mA |
| Electrode Polarity | +DC or -DC with Stainless Steel electrode (60 mm Dia.) |
| Vacuum Chamber | 165mm(D) x 125mm(H) Glass |
| Instrument Case | 450mm(W) x 350mm(D) x 170mm(H) |
| Weight | 15Kg |
| Supply | 115V 60 Hz (6 Amp Max) 230V 50 Hz (3 Amp Max) |
Ordering Information
| 94000 | EMS 100 Glow Discharge Unit | POR | Request Quote |
| 94100 | EMS 100 Glow Discharge Attachment for the EMS 450 & EMS 950 | POR | Request Quote |
| 91005 | E2M5 Rotary Vacuum Pump | $2,306.00 | Add to Cart |
EMS 125 Etch Facility Attachment
The EMS 125 consists of a Vacuum Collar, Stage with integral HT lead thró, and Shutter Assembly.
When configured as a Sputtering System, the "Target" material is biased negative with respect to earth, the whole of the chamber metal work also being bonded to earth.
During normal operation, the chamber atmosphere is rarified argon. A potential is applied between two electrodes. The argon molecules are ionized. Effectively, these molecules are now short of negative charge, and will therefore be attracted at speed towards the target. As these molecules strike the target material, they will dislodge parts of it. This material will then be attracted towards the specimen holder. Thus, any specimen placed on it will be coated.
When configured as an etch system, the target is now biased positive with respect to the specimen stage only. A shield is placed between the Stage and the Target simply to protect the target material.
FEATURES
- Etch and Sputter while maintaining vacuum.
- Vacuum Collar Assembly.
- Insulated Stage.
Ordering Information
| 91042 | EMS 125 Etch Facility (for the EMS 450, EMS 550 & EMS 650 Sputter Coaters) complete with Vacuum Collar and Glass Cylinder | POR | Request Quote |
Replacement Parts:
| 91043 | Spare Glass Cylinder | $175.00 | Add to Cart |
EMS 150 Film Thickness Monitor
The EMS 150 consists of a Control Unit external to the instrument and a Crystal Holder with an Interconnection Lead and Pre-Amplifier.
In addition, it has a vacuum collar to suit the appropriate Instrument Chamber.
The quartz crystal is placed in the vacuum work chamber. One face of the crystal is exposed towards the deposition source, such that, as material is deposited it will coat the crystal.
The crystal is connected via a vacuum feed through to external components, the whole becoming an oscillator whose output is controlled by the frequency of crystal oscillation. As material is deposited on the crystal, so its frequency of modification is modified.
This modification is used to determine the thickness of material deposited.
Features
- Terminate facility.
- Pre-selectable material density.
- Programmable tooling factor adjustment.
- Microprocessor controlled.
- Clean line design.
Specifications
| Instrument Case | 300mm(W) x 150mm(D) x 75mm(H) |
| Weight (Case & Collar) | 6Kg |
| To Suit: | EMS 450, EMS 550, EMS 575, EMS 650, EMS 675, EMS 950, and the EMS 975 |
| Crystal Holder | Exchange crystal facility |
| Density Range | 1.55 to 23.0g/cm-3 |
| Measurement Range | 5 to 999nm |
| Resolution for Carbon | 0.8nm |
| Resolution for Gold | 0.1nm |
| C.M.O.S. Memory Battery Back-up | 5 years |
| Supply | 115V 60 Hz (6 Amp Max) 230V 50 Hz (3 Amp Max) |
Ordering Information
| 91006 | EMS 150 Film Thickness Monitor complete with terminate unit including crystal holder and fitted crystal |
POR | Request Quote |
Replacement Parts
| 91008 | Spare Crystals | (set of 3) | $250.00 | Add to Cart |
| 91009 | Spare Glass Cylinder | $175.00 | Add to Cart |
EMS 250 Carbon Coating Attachment
What is CARBON COATING?
The use of Carbon Films in Electron Microscopy with their LOW background signal, and relatively good electrical conductivity is well known. Thin films, nominally 5nm or 50 Angstroms, are used in TEM, while a range of somewhat thicker films, ranging to 50nm or 500 Angstroms may be used in SEM for such applications as X-Ray Microanalysis.
Commonly, a High Vacuum Evaporator with Carbon Rods is used to achieve these coatings, and still has preferential applications. The use of Carbon Fiber, however, has allowed a Flash Evaporation technique to be developed which can be suitable for a number of general EM requirements.
The EMS 250 uses several Carbon Fiber types to cover a range of deposition thicknesses operating at rotary vacuum pressures utilizing the chamber of the Sputter Coater. Coating is omni-directional, and has a relatively short cycle time on the order of 5 minutes.
The system employs Low Voltage, High Current electrodes between which the carbon fiber is located. The electrode assembly employs a protective shutter to protect the specimen from heat radiation damage during the outgassing of the carbon fiber. At completion of this process, full power is applied to the electrodes, causing the carbon to burn quickly or 'Flash' the fiber fusing as part of the process.
The controls can be pre-selected to allow for different types of carbon fiber, and repeatable deposition thickness can be achieved.
Features
- Protection Shutter.
- Reproducible Coatings.
- Even thickness deposition over a range of coatings using string or cord.
- Spring loaded 'Quick Load' electrodes.
- Modular control electronics.
- Clean line design.
- Attachment to EMS 550/EMS 650 with interlock.
- Safety shield made from polycarbonate
Specifications
| Instrument Case | 235mm(W) x 350mm(D) x 175mm(H) |
| Carbon Head To Suit: | EMS 550, EMS 650, EMS 750 |
| Weight. | 15Kg |
| Carbon Source | Carbon String, Carbon Cord |
| Ammeter Gauge | 0-50 Amps |
| Low Voltage | 25 volts |
| Outgas Current, Selectable for: | 1 x String, 2 x String, 3 x String, 1 x Cord |
| Supply | 115V 60 Hz (6 Amp Max) 230V 50 Hz (3 Amp Max) |
Ordering Information
| 91040 | EMS 250 Carbon Attachment complete with Carbon Sources (1 Mtr String + 1 Mtr Cord supplied as standard) | POR | Request Quote |
Replacement Sources:
| 91045 | Carbon String, 1 meter | $25.00 | Add to Cart |
| 91046 | Carbon Cord, 1 meter | $28.00 | Add to Cart |
EMS 350 Sputter Coating Attachment
What is SPUTTER COATING?
When a glow discharge is formed between a Cathode and Anode using a suitable gas (typically Argon), and Cathode target material (commonly Gold) the bombardment of the target with gas ions will erode this target material, this process being termed "Sputtering".
The resulting omni-directional deposition of sputtered atoms will form an even coating on the surface of the specimen, normally located on the stage (anode) of the instrument. This electrically conductive thin coating will be representative of the surface of the specimen. It will inhibit charging, reduce thermal damage, and improve secondary electron emission which are beneficial for Scanning Electron Microscopy.
The EMS 350 system employs a Magnetron Target Assembly which enhances the efficiency of the process using low voltages, and giving a Fine Grain, Cool Sputtering, without the need to cool the target or the specimen stage.
It accommodates a range of specimen stubs, which together with pre-selectable parameters, gives defined and repeatable film thickness depositions.
The Instrument is fitted with 60mm diameter and 0.1mm thick gold quick change target, giving optimum consumable cost performance.
The integrated instrument panel and plug-in electronics, maximize 'up-time' and, with user friendly designs, ensures satisfactory multi-user discipline.
The sputtering parameters of current and time can be pre-set.
The sputtering head is interlocked with a vacuum switch mounted on the sputtering head in addition to the needle valve to control Argon Gas Flow.
Features
- Low energy 'cool' system (2 watts for cycle of 2 minutes less than 2°C/minute temperature increase).
- Low voltage sputtering (Order of 100V means DC).
- High resolution fine coating (Order of 2nm Gold Grain).
- Precise reproducible coatings.
- Even thickness deposition (Typically 20 nm or 200 Angstroms for SEM work).
- Safety shield made from polycarbonate
Specifications
| Instrument Case | 450mm(W) x 350mm(D) x 175mm(H) |
| Weight | 10Kg |
| Sputter Heads | 165mm Dia. (to suit EMS 450/EMS 750/EMS 950) |
| Target | 60mm(Dia.) x 0.1mm(Thick) (Gold fitted as standard) |
| Deposition Range | 0-50mA |
| Deposition Rate | 0-25 nm/minute (see note *) |
| Sputter Timer | 0-4 minutes |
| Supply | 115V 60 Hz (6 Amp Max) 230V 50 Hz (3 Amp Max) |
| Services | Argon Nominal 4 psi |
* Note: When used with EMS 750/EMS 950 base instrument different parameters
will apply.
EMS 750
| Target/Stage Spacing | 45mm |
| Deposition Rate | 25 nm/minute |
EMS 950
| Target/Stage Spacing | 100mm |
| Deposition Rate | 15 nm/minute |
Ordering Information
| 91082 | EMS 350 Sputter Attachment complete with Target 60mm x 0.1mm thick (Gold fitted inclusive as standard.) | POR | Request Quote |
Replacement Targets
| 91010 | Gold target | $750.00 | Add to Cart |
| 91012 | Platinum target | $850.00 | Add to Cart |
