Silicon Nitride TEM Window Grid, 25µm sq., 5nm

Silicon Nitride TEM Window Grids perform well under harsh lab conditions.

Silicon frames are 100 µm thick. Grids fit standard 3 mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation.

Features

Plasma Cleanable - can be vigorously plasma cleaned to remove organic contamination
Field to Field Uniformity - Less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid
Tolerates temperatures above 1000°C - Supports use in environmental TEMs where dynamic processes are observed at high temperatures
Withstands Harsh Conditions - Provides an ideal balance of imaging resolution, chemical stability and mechanical strength
Incorporates LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces