The single 500 x 500 um window is compatible with high tilt angle tomography. At 70 degrees of tilt, the thin and beveled 100 um silicon frame allows use of a ~50x50 micron region within the center of the window from any rotational orientation.
Substrates for x-ray microscopy and x-ray spectroscopy are flat, uniformly deposited films with consistent backgrounds with low field-to-field variability and high x-ray transmission.
Substrates for x-ray microscopy and x-ray spectroscopy are flat, uniformly deposited films with consistent backgrounds with low field-to-field variability and high x-ray transmission. For high temperature and differential pressure environments.
Low-stress silicon nitride lift-out grid is large and robust with a freely suspended side along one length of the window. The 100 micron thick frame and rounded half-grid shape fits flip-stage SEM/FIB holders and standard TEM sample holders.
Silicon Apertures no-membrane frames features a TEM window grid-style chip size but lack any suspended membrane so that there is a freely accessible opening through the chip frame.
Ideal subtrate for Cryo-Microscopy. This proprietary carbon coating may also improve charge dissipation leading to a reduction in beam induced movement. With large windows it provide viewing from any orientation at 70 degrees of tilt for tomography.
Silicon Nitride Window Grids perform well under harsh conditions. Silicon frames are 100um thick. Grids fit 3mm holders and most double tilt holders. In clear gel-boxes.
Pure Silicon TEM Windows feature imaging windows with 5 to 15 nm thickness, reducing background and interference for higher contrast imaging. Analyses of samples containing nitrogen and/or carbon is possible.
The grids tolerate temperatures above 1000°C and can be used in environmental TEMs for observing dynamic processes at high temp. Can be used when analyzing for nitrogen.
Holy Silicon Nitride Microporous TEM Grids with Square Pattern has square patterns on 200 nm Silicon Nitride. With a window size of 0.5 x 0.5 nm, a frame thickness of 200 µm, and membrane thickness of 200 nm.
Holy Silicon Nitride Nanoporous TEM Grids with Square Pattern has square patterns on 200 nm Silicon Nitride. With a window size of 0.5 x 0.5 nm, a frame thickness of 200 µm, and membrane thickness of 200 nm.
Holy Silicon Nitride Microporous TEM Grids with Indexed Hexagonal Pattern has square patterns on 200 nm Silicon Nitride. With a window size of 0.5 x 0.5 nm, a frame thickness of 200 µm, and membrane thickness of 200 nm.
Holy Silicon Nitride Nanoporous TEM Grids with Indexed Hexagonal Pattern has square patterns on 200 nm Silicon Nitride. With a window size of 0.5 x 0.5 nm, a frame thickness of 200 µm, and membrane thickness of 200 nm.