1.0 µm, 225 x 225 Layout, 2.0 µm Pitch

Holey Silicon Nitride TEM Grids

State-of-the-art support film.

This latest addition to our line of TEM Window Grids is manufactured using advanced MEMS technology to produce a unique 500 x 500 micrometer aperture with 200 nm low-stress silicon nitride membrane.

Available with square holey pattern or 5 x 5 indexed array with hexagonal holey film.

Features

  • Resistant to acids, bases, and solvents.
  • Can be easily plasma-cleaned to remove organic contamination.
  • Tolerates high-temperature experiments and imaging up to 1000°C.
  • Provides a carbon-free background.
  • Packaged under cleanroom conditions.

Specifications

Membrane Thickness 200 nm
Window Size 0.5 x 0.5 mm
Frame Thickness 200 µm

Square Pattern on 200 nm Silicon Nitride

Hole Size Layout Total No. Pitch Porosity
1.0 µm 225 x 225 50,625 2.0 µm 22.8%
SKU: 76043-45
Pack: 10 Pack
$358.00