200 nm, 1125 x 1125 Layout, 0.4 µm Pitch

Holey Silicon Nitride TEM Grids

State-of-the-art support film.

This latest addition to our line of TEM Window Grids is manufactured using advanced MEMS technology to produce a unique 500 x 500 micrometer aperture with 200 nm low-stress silicon nitride membrane.

Available with square holey pattern or 5 x 5 indexed array with hexagonal holey film.


  • Resistant to acids, bases, and solvents.
  • Can be easily plasma-cleaned to remove organic contamination.
  • Tolerates high-temperature experiments and imaging up to 1000°C.
  • Provides a carbon-free background.
  • Packaged under cleanroom conditions.


Membrane Thickness 200 nm
Window Size 0.5 x 0.5 mm
Frame Thickness 200 µm


Hole Size Layout Total No. Pitch Porosity
200 nm 1125 x 1125 1,265,625 0.4 µm 22.8%
SKU: 76043-55
Pack: 10 Pack