Holey Silicon Nitride TEM Window Grids, Nanoporous, Square
Holey Silicon Nitride TEM Grids
State-of-the-art support film.
This latest addition to our line of TEM Window Grids is manufactured using advanced MEMS technology to produce a unique 500 x 500 micrometer aperture with 200 nm low-stress silicon nitride membrane.
Available with square holey pattern or 5 x 5 indexed array with hexagonal holey film.
Features
- Resistant to acids, bases, and solvents.
- Can be easily plasma-cleaned to remove organic contamination.
- Tolerates high-temperature experiments and imaging up to 1000°C.
- Provides a carbon-free background.
- Packaged under cleanroom conditions.
Specifications
| Membrane Thickness |
200 nm |
| Window Size |
0.5 x 0.5 mm |
| Frame Thickness |
200 µm |
Nanoporous
| Cat# |
Hole Size |
Layout |
Total No. |
Pitch |
Porosity |
| 76043-50 |
750 nm |
300 x 300 |
90,000 |
1.5 µm |
22.3% |
| 76043-51 |
500 nm |
450 x 450 |
202,500 |
1.0 µm |
22.3% |
| 76043-52 |
400 nm |
562 x 562 |
315,844 |
0.8 µm |
22.8% |
| 76043-53 |
300 nm |
750 x 750 |
562,500 |
0.6 µm |
22.3% |
| 76043-54 |
250 nm |
900 x 900 |
810,000 |
0.5 µm |
22.3% |
| 76043-55 |
200 nm |
1125 x 1125 |
1,265,625 |
0.4 µm |
22.8% |
| 76043-56 |
150 nm |
1125 x 1125 |
1,265,625 |
0.4 µm |
22.4% |
| 76043-57 |
100 nm |
1125 x 1125 |
1,265,625 |
0.4 µm |
22.1% |