Silicon Nitride TEM Window Grid, (8)250 sq., (1)250x500µm, 10nm

Silicon Nitride TEM Window Grids perform well under harsh lab conditions.

Silicon frames are 100 µm thick. Grids fit standard 3 mm holders and most double tilt holders. They come in clear gel-boxes for simpler sample preparation.

Features

Plasma Cleanable - can be vigorously plasma cleaned to remove organic contamination
Field to Field Uniformity - Less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid
Tolerates temperatures above 1000°C - Supports use in environmental TEMs where dynamic processes are observed at high temperatures
Withstands Harsh Conditions - Provides an ideal balance of imaging resolution, chemical stability and mechanical strength
Incorporates LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride to provide flat, insulating and hydrophobic surfaces

Recommended Use

High Resolution Imaging:	5 nm	76042-43, 1 square (25 x 25 µm) 76042-44, 9 squares (50 x 50 µm) 76042-45, 2 slots (50 x 1500 µm)*
Robust, Increased High Resolution:	10 nm	76042-46, 9 squares (100 x 100 µm)
Everyday Imaging:	20 nm	76042-49, 1 square (500 x 500 µm) 76042-48, 9 squares (100 x 100 µm)
Demanding Conditions:	50 nm	76042-53, 1 square (100 x 100 µm) 76042-52, 1 square (500 x 500 µm) 76042-51, 1 square (1000 x 1000 µm) 76042-50, 9 squares (100 x 100 µm)
Cryo-EM & Materials Suspension:	Microporous	76042-41, 1 square (500 x 500 µm) 76042-40, 1 square (500 x 500 µm)