301CE With Pin

Overall Benefits:

  • Easier testing of your SPM.
  • Improved accuracy of critical dimension measurements.
  • Accuracy: 0.5% (1 std. dev.).

Features and Benefits:

  • Holographic fabrication - assures high accuracy and precision.
  • Pattern height > 100 nm - provide excellent image contrast.
  • Uniform coverage of entire chip - save time (can image anywhere).


  • Nominal calibrated dimensions: 300 or 700 nm.
  • Calibration certificate: supplied with each sample, stating the dimension to the nearest 1 nm.
  • Pattern types: 1- or 2—Dimensional. The calibrated dimension is the same for both axes for the 2-D standard.
  • Feature geometry:
    -parallel ridges (1-D, 300 or 700 nm)
    -cylindrical posts (2-D 300 nm)
    -diamond-shaped posts (2-D 700 nm)
  • Physical Size: 3 mm x 4 mm x 0.5 mm.
  • Substrate: Silicon wafer.
  • Top surface: Tungsten film.

The 1-D standards can be scanned using any AFM mode, including contact mode. The 2-D standards can be scanned using modes such as Tapping Mode™, intermittent contact, and non-contact.

AFM calibration specimen
Model 150-1D

Accurate measurements of sub 0.5 micron features are increasingly important as nanotechnology develops and as conventional microfabricated structures (semiconductors, magnetic data storage devices, optical data discs) shrinking. The model 150-1D with a nominal period (pitch) of 150 nm, one dimensional, fabricated on a transparent substrate (Aluminum lines on glass) is the new tool to support this work.

scanning probe microscope calibration specimensModel 750-HD
High Durability Calibration Reference Specimen for AFM and STM

Each specimen is supplied with a calibration certificate. Can be used for AFM, STM and SEM. Has been used successfully in a hot water AFM.

Nominal pattern dimensions: Pitch 750 nm
  Height 100 nm
Nominal specimen dimensions: 6.35 mm diameter, 0.3 mm thick
Composition: Solid Nickel
Model PTAtomic force microscope calibration specimens

Phase Imaging Test Specimen (verify TappingMode™ phase contrast and resolution).

Phase Imaging is a sharp probe, which is brought into proximity with the specimen surface. The probe is oscillated vertically near its mechanical resonance frequency. As the probe lightly taps the surface, the amplitude of oscillation is reduced and the AFM uses this change in amplitude in order to track the surface topography. In addition to its amplitude, the probe motion can be characterized by its phase relative to a driving oscillator. The phase signal changes when the probe encounters regions of different composition. Phase shifts are registered as bright and dark regions in phase images, comparable to the way height changes are indicated in height images.

Phase images often show extraordinary contrast for many composite surfaces of technological and scientific interest. These include contamination deposits, discontinuous (i.e. defective) thin films, devices built of composite materials (e.g. magnetic recording heads), and cross-sectional specimens of composite materials. Both inorganic and organic materials can be examined. We have found that phase imaging is more convenient and gentler than other methods, which are based on contact mode operation. It routinely achieves lateral resolution of 10 nm.

Models 300-2D, 300-1D, 700-2D and 700-1D

All mounted on 15 mm steel disk.

Models 300-1D and 300-2D AFM calibration specimens Scanning force calibration specimens
Parallel Ridges
Pitch 288
W-coated Photoresist on Si
use contact or TappingMode
Array of Posts
Pitch 297
Al bumps on Si
use contact or TappingMode
Models 700-1D and 700-2D Microscope SPM calibration specimen Microscope SPM calibration specimen
Parallel Ridges
Pitch 700
W-coated Photoresist on Si
use contact or TappingMode
Array of Posts
Pitch 700
W-coated Photoresist on Si
use TappingMode 
Model 302-EDU

Student grade calibration specimen. 2-dimensional, 297 nm nominal period. Aluminum bumps on Si.


1. Pereira, D.E.D. & Claudio-da-Silva, Jr., E. “Improvement of AFM as an analytical Instrument for Residual Lignin Characterization” in: Proceedings International Symposium on Wood and Pulping Chemistry, Helsinki, Finland, June 1995.

2. Pereria, D.E.D, Chernoff, D., Claudio-da-Silva, Jr. E., & Cemuner, B.J., “The use of AFM to investigate the delignification process: Part I –AFM performance by differentiating pulping processes”, to be published.


SKU: 80110-31-Pin
Pack: Each
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Products specifications
Attribute name Attribute value
Material W-coated Photoresist on Si