Holey Silicon Nitride TEM Grids
State-of-the-art support film.
This latest addition to our line of TEM Window Grids is manufactured using advanced MEMS technology to produce a unique 500 x 500 micrometer aperture with 200 nm low-stress silicon nitride membrane.
Available with square holey pattern or 5 x 5 indexed array with hexagonal holey film.
Features
- Resistant to acids, bases, and solvents.
- Can be easily plasma-cleaned to remove organic contamination.
- Tolerates high-temperature experiments and imaging up to 1000°C.
- Provides a carbon-free background.
- Packaged under cleanroom conditions.
Specifications
| Membrane Thickness |
200 nm |
| Window Size |
0.5 x 0.5 mm |
| Frame Thickness |
200 µm |
Indexed Hexagonal Pattern
Microporous
| Cat# |
Hole Size |
Layout |
Total No. |
Pitch |
Porosity |
| 76043-60 |
10.0 µm |
4 x 4 x 25 |
400 |
20.0 µm |
22.8% |
| 76043-61 |
5.0 µm |
8 x 8 x 25 |
1,600 |
10.0 µm |
22.8% |
| 76043-62 |
2.5 µm |
16 x 16 x 25 |
6,400 |
5.0 µm |
22.8% |
| 76043-63 |
2.0 µm* |
25 x 25 x 25 |
15,625 |
3.0 µm |
22.8% |
| 76043-64 |
1.2 µm† |
32 x 32 x 25 |
25,600 |
2.5 µm |
22.8% |
| 76043-65 |
1.0 µm |
40 x 40 x 25 |
40,000 |
2.0 µm |
22.8% |