Holey Silicon Nitride TEM Window Grids, Microporous, Square
Holey Silicon Nitride TEM Grids
State-of-the-art support film.
This latest addition to our line of TEM Window Grids is manufactured using advanced MEMS technology to produce a unique 500 x 500 micrometer aperture with 200 nm low-stress silicon nitride membrane.
Available with square holey pattern or 5 x 5 indexed array with hexagonal holey film.
Features
- Resistant to acids, bases, and solvents.
- Can be easily plasma-cleaned to remove organic contamination.
- Tolerates high-temperature experiments and imaging up to 1000°C.
- Provides a carbon-free background.
- Packaged under cleanroom conditions.
Specifications
| Membrane Thickness |
200 nm |
| Window Size |
0.5 x 0.5 mm |
| Frame Thickness |
200 µm |
Square Pattern on 200 nm Silicon Nitride
| Cat# |
Hole Size |
Layout |
Total No. |
Pitch |
Porosity |
| 76043-40 |
10.0 µm |
22 x 22 |
484 |
20.0 µm |
22.8% |
| 76043-41 |
5.0 µm |
45 x 45 |
2,025 |
10.0 µm |
22.8% |
| 76043-42 |
2.5 µm |
90 x 90 |
8,100 |
5.0 µm |
22.8% |
| 76043-43 |
2.0 µm* |
150 x 150 |
22,500 |
3.0 µm |
22.8% |
| 76043-44 |
1.2 µm† |
180 x 180 |
32,400 |
2.5 µm |
22.8% |
| 76043-45 |
1.0 µm |
225 x 225 |
50,625 |
2.0 µm |
22.8% |