Quorum Q300T ES Plus Large Chamber, Turbo-Pumped Sputter Coater/Carbon Coater

The Q300T T Plus is a large chamber, turbo-pumped coating system, ideally suited for sputtering a single large diameter specimen up to 150mm. Ideal for high resolution SEM, large samples e.g Silicon Wafers, protective platinum layers for FIB, and carbon coating for elemental analysis and TEM

Recommended applications for Q300T ES Plus:

• High resolution SEM
• Large samples e.g Silicon Wafers (up to 150 mm)
• Protective platinum layers for FIB
• Carbon coating for elemental analysis and TEM

These products are for Research Use Only.

Detachable chamber with built-in implosion guard
Removable glass chamber and easily accessible base and top plate allows for an easy cleaning process. Users can rapidly change the chamber, if necessary, to avoid cross contamination of sensitive samples. Tall chamber option is available for improved uniformity for sputtering and to hold larger substrates.

Safety
The Q300T ES Plus meets key industry CE standards

• All electronic components are protected by covers
• Implosion guard prevents user injury in event of chamber failure
• Vacuum interlocks remove power from deposition sources to prevent user exposure to high voltage in event of chamber being opened
• Overheating protection shuts down power supply

Vacuum control
High vacuum turbo pumping allows sputtering of a wide range of oxidizing and non-oxidizing metals for thin film and electron microscopy applications. Automatic vacuum control which can be pre-programmed to suit the process and material, therefore removing the need for manual intervention or control.

Cool magnetron sputtering
Sputter coating is a technique widely used in various applications; it is possible to create a plasma and sputter metals with high voltage, poor vacuum and no automation. However, this is not suitable for electron microscopy applications because it can heat the sample and result in damage when the plasma interacts with the sample. The Q300T ES Plus uses low temperature enhanced-plasma magnetrons optimized for the turbomolecular pump pressures, combined with low current and deposition control, which ensures your sample is protected and uniformly coated.
The Q300T ES Plus uses easy-change, 57 mm diameter, disc-style targets which are designed to sputter oxidizing and noble metals. The Q300T ES Plus is fitted as standard with a chromium (Cr) sputter target. Other targets options include; Cr, Ir, W, Al, Ti, Au, Pt, etc.

Pulsed cleaning for aluminum sputtering
Aluminum (Al) rapidly forms an oxide layer which can be difficult to remove. The Q300T ES Plus has a special recipe for Aluminum that reduces the oxide removal time and prevents excessive pre-sputtering of the target

Film thickness monitor
The Q300T ES Plus can be fitted with an optional film thickness monitor (FTM), which measures the coating thickness on a quartz crystal monitor within the chamber, in order to control the coating thickness of material deposited on to the sample.