Magnification Reference Standards - SPM, AFM, SEM Calibration Standards

Calibration for SEM

Calibration standards for SEM are used for assessing the accuracy and consistency of a number of SEM aspects, including magnification settings, imaging parameters, and analytical tools like energy-dispersive X-ray spectroscopy (EDS) systems.
Serving as the benchmark against which the SEM’s measurements and analyses can be calibrated, calibration standards are available in several specific material types, including compound standards, pure metal standards, NBS standards, and BAS standards. At EMS, we also carry AFM calibration samples, as well as very high-resolution calibration references and traceable standards for AFM, SEM, Auger, and FIB.

Magnification Reference Standards

Often featuring patterns with precisely defined dimensions, magnification reference standards are utilized to assess an SEM’s magnification accuracy. At EMS, we offer a series of calibration standards with one- and two-dimension calibrated patterns. The standards come in two grid spacings – 300 nanometers and 700 nanometers — and are created utilizing holographic interference of a particular laser frequency. They’re typically accurate to <1% across the entire surface of the standard.

Background

EMS MXS "CE" and "BE" series SEM magnification reference gratings and grids set new standards for sub-micron accuracy and ease of use. Designed to meet the requirements for a reasonable cost, accurate sub-micron reference standard, "CE" Series Reference Standards can be tailored to meet a variety of needs.
These standards are also ideal for student practice and instruction, testing new ideas or applications, or other uses where you need a good quality standard but do not want to put an expensive sample at risk. Exceptional accuracy, repeatability, and uniformity are assured, since each individual standard is an original or master produced directly from a holographic interference pattern.
Additionally, these reference standards are remarkably durable under typical operating conditions and have great surface contamination behavior. There are no better
sub-micron reference standards available in this price range.

For example, one test site indicated that on a scale of 1 to 5 with respect to ease of use, contrast/brightness, durability, and accuracy, "CE" series reference standards earn a 4.7 out of 5 average in comparison to other available standards. Comments from various other test sites included "very good contrast/brightness levels at all voltages used," "easy to use," and "could become my secondary standard of choice."

Materials

White area material: Tungsten.
Black area material: Tungsten, or other metal.

The calibration specimen consists of a silicon chip with a thin (100 nm) polymer layer containing the pattern and a thin tungsten film over-coating the entire surface. The tungsten film varies from 20 nm to 60 nm in thickness, depending on the particular model. This structure has been proven under a wide variety of beam conditions, from 30kV to sub 12 kV.
Dimensions: 300 nm or 700 nm nominal (exact dimension will be provided with sample). Measurements are made from leading edge to leading edge, etc. The width of individual bars and spaces is not calibrated.

Application

EMS's MXS "CE" series reference standards provide a calibrated dimension of either 300 nm or 700 nm nominal length. ("BE" series available only 300 nm).
The larger dimension provides accurate, multiple-period measurement from about 5000x to over 45,000x while the smaller dimension is useful from about 10,000x to over 100,000x. Throughout this magnification range, these standards provide excellent image contrast, an enormous useful calibration area, and a 3-sigma accuracy of at worst 3%, with typical values around 1%.

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